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Method, control wafer and photomask for measuring and monitoring numerical aperture of exposure machine

A numerical aperture and photomask technology, applied in the field of photolithography technology, can solve the problems of high price and low penetration rate, and achieve the effect of low cost

Inactive Publication Date: 2010-07-21
MAXCHIP ELECTRONICS CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, this kind of numerical aperture measuring instrument is very expensive and its popularity is not high.

Method used

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  • Method, control wafer and photomask for measuring and monitoring numerical aperture of exposure machine
  • Method, control wafer and photomask for measuring and monitoring numerical aperture of exposure machine
  • Method, control wafer and photomask for measuring and monitoring numerical aperture of exposure machine

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Embodiment Construction

[0041] Figure 1A , 2 ~5 depicts a method for measuring the numerical aperture of an exposure machine in a preferred embodiment of the present invention, wherein Figure 1A depicting the control plate used in the method and the scale markings on it, figure 2 The aberration photomask used in this method is shown.

[0042] Please refer to Figure 1A , 2 Firstly, a control sheet 10 and an aberration photomask 20 are provided, wherein the control sheet 10 has a plurality of scale marks 100 arranged in an array, located in the central area 12, and the aberration photomask has a plurality of scale marks 100 arranged in an array A plurality of pinholes 22 in a shape, wherein the position of each pinhole 22 corresponds to the position of a scale mark 100 .

[0043] In an embodiment, each scale mark 100 on the control sheet 10 includes at least one scale mark pattern, such as Figure 1A Shown is a scale line pattern 102 made of a material such as polysilicon, metal or silicon nitrid...

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Abstract

The invention discloses a method, a control wafer and a photomask for measuring and monitoring the numerical aperture of an exposure machine. The method for measuring and monitoring the numerical aperture of the exposure machine comprises the following steps of: firstly, providing the control wafer and an aberration photomask, wherein the control wafer is provided with a plurality of calibrated scale marks and the aberration photomask is provided with a plurality of pin holes, the position of each pin hole corresponds to that of one calibrated scale mark; then carrying out a photo-lithographic process on the control wafer by using the exposure machine and the aberration photomask so as to form a photoresist pattern above each calibrated scale mark, wherein the shape of the photoresist pattern is same as that of an illuminated pattern of a light source of the exposure machine; and then solving the numerical aperture of the exposure machine by using the calibrated scale mark corresponding to the edge of the photoresist pattern. The numerical aperture of the exposure machine can be easily solved by using the method for measuring and monitoring the numerical aperture of the exposure machine without using expensive numerical aperture measuring devices.

Description

technical field [0001] The present invention relates to a photolithography process, in particular to a method for measuring the numerical aperture (Numerical Aperture, NA) of an exposure machine, and a control wafer and a vernier mark used in the method. Background technique [0002] In the patterning process, the numerical aperture (NA) of the exposure machine is a very important parameter, because it is related to the resolution of the correctness of the pattern transfer (R=k 1 λ / NA) and depth of focus (DOF=k 2 λ / NA 2 ) and other parameters are directly related. Therefore, each exposure machine used in the integrated circuit process must have the same numerical aperture setting, so as to make the characteristics of the product consistent. [0003] However, since the numerical aperture of each exposure machine is somewhat different, it is often necessary to compensate for the difference during use to minimize the difference. Before the compensation, the respective numeri...

Claims

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Application Information

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IPC IPC(8): G03F7/20G03F1/00G03F9/00G03F1/44
Inventor 吴健民陈建志
Owner MAXCHIP ELECTRONICS CORP