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Method for quantitatively testing threshold value of photo-induced light scattering exposure energy density of photorefractive materials

A technology of exposure energy and density threshold, applied in the field of parameter testing of photorefractive materials

Inactive Publication Date: 2011-11-23
HARBIN INST OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The photorefractive light scattering exposure energy density threshold of photorefractive materials can essentially reflect the photoinduced light scattering of photorefractive materials, but there is no feasible solution to quantitatively test it

Method used

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  • Method for quantitatively testing threshold value of photo-induced light scattering exposure energy density of photorefractive materials
  • Method for quantitatively testing threshold value of photo-induced light scattering exposure energy density of photorefractive materials
  • Method for quantitatively testing threshold value of photo-induced light scattering exposure energy density of photorefractive materials

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specific Embodiment approach 1

[0015] Specific Embodiment 1: The method for quantitatively testing the photorefractive material light-induced light scattering exposure energy density threshold of this embodiment is realized based on the device for quantitatively testing the photorefractive material light-induced light scattering exposure energy density threshold. The device includes a laser 1, an adjustable attenuator 2, a photorefractive crystal 3, an aperture 4, and a power meter 5; the laser beam output by the laser 1 is attenuated by the adjustable attenuator 2, and then enters the photorefractive crystal 3, passes through the optical The transmitted light transmitted by the refraction crystal 3 is received by the power meter 5 after passing through the aperture 4;

[0016] The method for quantitatively testing the photoinduced light scattering exposure energy density threshold of photorefractive materials, its process is:

[0017] Step 1. Laser 1 outputs a beam of polarized laser light as incident ligh...

specific Embodiment approach 2

[0026] Embodiment 2: This embodiment is a further limitation of Embodiment 1. The device for quantitatively testing the photorefractive light scattering exposure energy density threshold of photorefractive materials also includes a lens 6, and the lens 6 is placed in a Between the attenuator 2 and the photorefractive crystal 3;

[0027] In the method for quantitatively testing the photoinduced light scattering exposure energy density threshold of photorefractive materials, the process of step 1 is as follows:

[0028] Laser 1 outputs a beam of polarized laser light as incident light Q in transmitted to adjustable attenuator 2, the incident light Q in After being attenuated by the adjustable attenuator 2, and then converged by the lens 6, it is vertically incident on the surface of the photorefractive crystal 3, and the polarization direction of the incident light is parallel to the c-axis direction of the photorefractive crystal 3, and then, through The transmitted light Q o...

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Abstract

The present invention provides a method for quantitatively testing the threshold value of photo-induced light scattering exposure energy density of photorefractive materials, which relates to the field of parameter testing of photorefractive materials. The invention solves the problem that no feasible scheme is provided for quantitatively testing the threshold value of the photo-induced light scattering exposure energy density of the photorefractive materials. The method comprises the following steps of: after polarized incident light is attenuated, carrying out vertical incidence onto the surface of a photorefractive crystal, wherein the polarization direction of the incident light is parallel with the axle c of the photorefractive crystal; receiving transmitted light by utilizing a power meter; keeping the optical power density of the incident light constant, recording optical power received by the power meter at fixed time intervals, then, acquiring a curve indicating the change of the optical power density of the transmitted light along with the change of time and further acquiring a curve indicating the change of the optical power density of the scattered light along with the change of time and a curve indicating the change of the square root of the scattering ratio along with the change of time; and fitting the curve indicating the change of the square root of the scattering ratio along with the change of time to acquire a scattering time constant tau, and computing and acquiring the threshold value of the exposure energy density according to the following formula: S=tau*Iin. The method for quantitatively testing the threshold value of photo-induced light scattering exposure energy density of photorefractive materials provided by the present invention can be applied to the field of holographic storage of optical informosome.

Description

technical field [0001] The invention relates to the field of parameter testing of photorefractive materials, in particular to a method for quantitatively testing the photoinduced light scattering exposure energy density threshold of photorefractive materials. Background technique [0002] When photorefractive crystals are used in holographic storage systems, there are many noises in them, which seriously affect the quality of volume holographic storage and reproduction images. One of the main sources of noise is the crystal's scattering noise, i.e. light-induced light scattering. It is a nonlinear light scattering process. The existence of scattering noise leads to a decrease in the effective dynamic range of the recording medium, thereby reducing the number of stored holograms. It is one of the biggest obstacles in the practical application of photorefractive holographic memory. . The existing technical solutions use the light intensity threshold of light-induced scatteri...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01N21/47
Inventor 骆素华姜向前时红艳孟庆鑫孙秀冬
Owner HARBIN INST OF TECH