Light irradiation apparatus for exposure apparatus, exposure apparatus, and exposure method
A technology of exposure device and irradiation device, which is applied in the direction of exposure device of photoplate making process, cooling/heating device of lighting device, lighting device, etc., which can solve the difficulty of curved surface processing and the time of device stop (downtime becomes longer, time-consuming, etc.) problem, achieve the effect of shortening the time to replace the lamp
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
no. 1 Embodiment approach
[0106] Such as figure 1 and 2 As shown, the split progressive exposure apparatus PE of the first embodiment includes a mask stage 10 holding a mask M, a substrate stage 20 holding a glass substrate (material to be exposed) W, and an illumination optical system for radiating light for pattern exposure. 70.
[0107] In addition, the glass substrate W (hereinafter, simply referred to as "substrate W") is arranged to face the mask M, and is placed on the surface (opposing surface side of the mask M) on which the pattern drawn on the mask M should be exposed and transferred. A sensitizer is applied.
[0108] The mask stage 10 includes: a mask stage base 11 having a rectangular opening 11a formed in the center; The part is the mask holding frame 12; the mask driving mechanism 16 is provided on the upper surface of the mask table base 11 and moves the mask holding frame 12 along the X axis, Y axis, and θ direction to adjust the position of the mask M.
[0109] The mask stage base...
no. 2 Embodiment approach
[0155] Next, as a second embodiment of the present invention, an exposure method using the split progressive exposure apparatus PE of the first embodiment will be described.
[0156] The split progressive exposure apparatus PE of the above-mentioned embodiment can respond to the sensitivity characteristics of various protective films by changing the illuminance of the light irradiation apparatus 80 . Since the exposure amount is calculated by the product of illuminance and time, an appropriate exposure amount can be obtained by changing the illuminance or time. However, in order to shorten the production time, the time is set very short, so it is difficult to further change the time. Therefore, in order to obtain an appropriate exposure amount by changing the illuminance, low illuminance is generally achieved using a dimming (ND) filter or the like. In this case, useless power consumption occurs, and optical components such as ND filters are required.
[0157] Therefore, in t...
no. 3 Embodiment approach
[0165] Next, as a third embodiment of the present invention, refer to Figure 22 An example of a control method for turning on or off the lamp 71 of the light irradiation device 80 will be described.
[0166] In this embodiment, if Figure 22 As shown, for the lamp 71 that can be turned on / off synchronously, the area of the lamp 71 that is turned on is managed according to time, and during the exposure operation or the non-exposure operation (for example, during substrate loading and during shooting), the predetermined time Make the area change sequentially. Also in this case, as in the second embodiment, the lamps 71 are turned on or off point-symmetrically with respect to the point Q for each lamp 71 in the lamp box 81 so that the illuminance distribution on the exposure surface does not change. Thereby, while maintaining the same illuminance, it is possible to easily manage turning on and off of the lamp 71 without deviating from the frequency of use of the lamp 71 . I...
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More