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Lithographic apparatus and method for illumination uniformity correction and uniformity drift compensation

A technology of lithography equipment and irradiation system, which is applied in the direction of microlithography exposure equipment, photomechanical equipment, photolithography exposure device, etc.

Inactive Publication Date: 2010-12-22
ASML HLDG NV +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Thus, the lithographic apparatus absorbs heat that causes expansion of components of the apparatus, resulting in drift, movement and uniformity changes

Method used

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  • Lithographic apparatus and method for illumination uniformity correction and uniformity drift compensation
  • Lithographic apparatus and method for illumination uniformity correction and uniformity drift compensation
  • Lithographic apparatus and method for illumination uniformity correction and uniformity drift compensation

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Embodiment Construction

[0052] The present invention relates to a method of using a uniformity compensator to compensate for uniformity drift, for example due to illumination beam motion, column uniformity, uniformity compensator drift, and the like. This specification discloses one or more embodiments that incorporate the features of this invention. The disclosed embodiments are only illustrative of the invention. The scope of the invention is not limited to the disclosed embodiments. The invention is defined by the appended claims.

[0053] The described embodiments and references in the specification to "one embodiment", "an embodiment", "exemplary embodiment" and the like mean that the described embodiments may include particular features, structures or characteristics, however, each embodiment It may not be necessary to include specific features, structures or characteristics. Also, these paragraphs are not necessarily referring to the same embodiment. In addition, when specific features, st...

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Abstract

The invention discloses a lithographic apparatus and a method for illumination uniformity correction and uniformity drift compensation. The lithographic apparatus including a uniformity correction system is disclosed. Fingers move into and out of intersection with a radiation beam to correct an intensity of the radiation beam. Actuating devices are coupled to the fingers. A width of a tip of each of the fingers is half that of a width of the actuating devices. Systems and methods compensate for uniformity drift. An illumination slit uniformity caused by system drift is measured. First positions of uniformity compensators are determined based on the uniformity. Uniformity compensators are moved to the first respective positions. A substrate is exposed.

Description

technical field [0001] The present invention relates to a lithographic apparatus and an illumination uniformity correction system. The present invention relates generally to lithography, and more particularly to a system and method for compensating for uniformity drift, eg, due to illumination beam motion, beam uniformity, uniformity compensator drift, and the like. Background technique [0002] A lithographic apparatus is a machine that applies a desired pattern onto a target portion of a substrate. For example, lithographic equipment may be used in the manufacture of integrated circuits (ICs). In this case, a patterning device, alternatively referred to as a mask or reticle, can be used to generate a circuit pattern corresponding to the individual layers of the IC, and this pattern can be transferred to a substrate with radiation-sensitive material (resist). agent) layer on a substrate (eg, a silicon wafer) on a target portion (eg, including a portion of the die, one or ...

Claims

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Application Information

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IPC IPC(8): G03F7/20
CPCG03F7/70133G03F7/70058G03F7/70191G03F7/2004G03F7/70091H01L21/0274
Inventor 理查德·卡尔·齐默曼亨德里克斯·罗伯特·玛丽·范格立布鲁克皮特·C·康切尔斯伯格托德·R·丹尼伊丽莎白·斯通西拉特·伊什特万·希萨弗德里克斯·忽必克奥尔加·弗拉基米尔
Owner ASML HLDG NV
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