Unlock instant, AI-driven research and patent intelligence for your innovation.

Illuminating apparatus, exposure apparatus, exposure method and device manufacturing method

A technology for lighting devices and components, which can be applied in photolithography process exposure devices, semiconductor/solid-state device manufacturing, electrical components, etc.

Active Publication Date: 2012-11-07
NIKON CORP
View PDF1 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In this case, compared with the case of illuminating with illumination light that is similarly filled in one kind of beam, the projected image of the pattern is easily affected by aberrations remaining in the projection optical system, and the pattern may be affected. Plate transfer accuracy drops

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Illuminating apparatus, exposure apparatus, exposure method and device manufacturing method
  • Illuminating apparatus, exposure apparatus, exposure method and device manufacturing method
  • Illuminating apparatus, exposure apparatus, exposure method and device manufacturing method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0036] Hereinafter, an illumination device, an exposure device, an exposure method, and a device manufacturing method according to embodiments of the present invention will be described with reference to the drawings. figure 1 It is a perspective view which shows the whole structure of the exposure apparatus EX concerning 1st Embodiment of this invention. In this embodiment, an exposure apparatus of a step-and-scan method is described as an example. This exposure apparatus makes a projection optical system composed of a plurality of catadioptric type partial projection optical systems with a mask M and a flat plate (photosensitive substrate) P. PL moves synchronously, and transfers the projection image of the pattern formed on the mask M onto the flat plate P.

[0037] Also, in the following description, set the figure 1 The XYZ rectangular coordinate system shown in , and the positional relationship of each member will be described with reference to this XYZ rectangular coor...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

An illuminating apparatus is provided with a light guide fiber (10), which receives illuminating light emitted from light sources (2a, 2b, 2c) from a plurality of light incoming ports (12a, 12b, 12c) and outputs, from a common light outputting port (14a), at least a part of each illuminating light received by each light incoming port; an illuminating relay optical system (6b) which optically relays the illuminating light emitted from the light source (2b) and permits the relayed light to be a first luminous flux having a first incidence angle so as to introduce the first luminous flux into the light incoming port (12b); and illuminating relay optical systems (6a, 6c), which optically relay the illuminating light emitted from the light sources (2a, 2c) and permit the relayed light to be a second luminous flux having a second incidence angle different from the first incidence angle so as to introduce the second luminous flux into the light incoming ports (12a, 12c).

Description

technical field [0001] The present invention relates to an illumination device, an exposure device, an exposure method, and a device manufacturing method for emitting illumination light introduced from a plurality of parts from a common part. Background technique [0002] In the prior art, an exposure device is used to manufacture components such as semiconductor elements, liquid crystal display elements, and thin-film magnetic heads through photolithography. In the manufacturing process using this photolithography method, the pattern formed on the photomask as an original painting is illuminated with illumination light, and transferred to the substrate coated with a photosensitive agent such as a photoresist through a projection optical system. on the tablet. [0003] In recent years, in response to demands for larger areas of liquid crystal display elements and the like, it is necessary to expand the exposure area of ​​an exposure device. In this regard, a multi-lens typ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/027G03F7/20
CPCG03F7/7005G03F7/70208G03F7/20H01L21/0274
Inventor 福井达雄加藤正纪
Owner NIKON CORP