Etching device and etching method
An etching device and etching technology, applied in the field of etching, can solve the problems of fast flow speed, fast update, uneven etching of circuit substrates, etc., and achieve the effect of consistent etching speed, same update speed, and avoiding pool effect.
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[0015] The etching device and etching method provided by the present technical solution will be described in detail below in conjunction with the drawings and embodiments.
[0016] Refer to figure 1 The etching device 100 provided in the first embodiment of the technical solution includes two liquid infusion pipes 10, four nozzle pipes 20, pumps 11a, 11b, valves 12a, 12b, a liquid scraping device 30 and a control device 40.
[0017] The two infusion tubes 10 are opposite and arranged parallel to each other. Each liquid infusion tube 10 communicates with a liquid storage tank (not shown), and the etching liquid is delivered to the four nozzle tubes 20 through pumps 11a and 11b, respectively.
[0018] The four nozzles 20 are arranged parallel to each other, and the two ends of each nozzle 20 are respectively communicated with an infusion tube 10, so that the etching liquid can flow from the nozzle 20 through the infusion tube 10 from the liquid storage tank. Each nozzle 20 is provided...
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