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Etching line roller, etching transmission line and etching device

A technology for etching lines and transmission lines, applied in the field of etching equipment, can solve problems such as unsatisfactory solutions, and achieve the effects of high product quality, high reliability, and improved dimensional accuracy and uniformity

Pending Publication Date: 2022-04-29
常州高光半导体材料有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] In view of the unsatisfactory solution to the existing "pool effect" problem, in order to improve the product quality of the above-mentioned metal mask, it is urgent to find a new solution to the above-mentioned "pool effect" problem

Method used

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  • Etching line roller, etching transmission line and etching device
  • Etching line roller, etching transmission line and etching device
  • Etching line roller, etching transmission line and etching device

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Embodiment Construction

[0038] In order to make the purpose, technical solutions and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings. Obviously, the described embodiments are only some of the embodiments of the present invention, rather than all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention. The present invention will be further described below in conjunction with the accompanying drawings and embodiments.

[0039] An etching device is provided in this embodiment, and the etching device may be one of equipment such as a developing machine or an etching machine used in the etching process. Refer to attached Figure 6 As shown in , the above-mentioned etching device includes a horizontally arranged etching transmission line 2 ...

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Abstract

The invention provides an etching line roller, an etching conveying line and an etching device, and relates to the technical field of etching equipment. The etching line roller comprises a wheel shaft and a plurality of wheel sheets, and the wheel sheets are arranged on the wheel shaft at intervals and are symmetrically distributed relative to the center line of the wheel shaft; and the diameters of the wheel sheets in the direction from the center line of the wheel shaft to the two ends of the wheel shaft are sequentially decreased. The etching conveying line comprises the etching line roller; and the plurality of etching line rollers are horizontally arranged in parallel at intervals along the conveying direction. The etching device comprises the etching conveying line, an upper side spraying device arranged on the upper side of the etching conveying line, and / or a lower side spraying device arranged on the lower side of the etching conveying line. By improving the structure of the etching line roller, the conveying surface of the etching conveying line is a convex surface, so that the middle of the metal mask is higher than the two sides of the metal mask during on-line conveying, liquid medicine directly flows away to the two lower sides and cannot be gathered, and the'pool effect 'is thoroughly avoided.

Description

technical field [0001] The invention relates to the technical field of etching equipment, in particular to an etching line roller, an etching transmission line and an etching device. Background technique [0002] At present, as display technologies such as organic light-emitting diodes (OLED, Organic Light Emitted Diode) and active matrix organic light-emitting diodes (AMOLED, Active-matrix organic light-emitting diode) are becoming more and more mature, metal masks are used to prepare OLEDs. The important components of this kind of display panel have gradually become the products that various upstream manufacturers are vying for layout. [0003] Patterns on metal masks are generally made by etching. When the metal mask is processed by the chemical reaction in the developing machine and the etching machine, the liquid is easy to gather in certain positions in the metal mask and cannot flow away (that is, the "pool effect" often referred to in the industry), which eventually...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23F1/08C23F1/02
CPCC23F1/08C23F1/02
Inventor 吴建钱超杨柯
Owner 常州高光半导体材料有限公司
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