A multi-parameter automatic control and efficient rotary spray etching system
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- XI AN JIAOTONG UNIV
- Publication Date
- 2021-09-07
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Abstract
Description
technical field
[0001] The invention belongs to the technical field of mechanical micromachining, and particularly relates to a spray etching device which can be used for preparing printed circuit board heat exchangers or cylindrical microchannel heat exchangers and even complex surface structures. Background technique
[0002] The existing spray etching technology is mainly aimed at flat plate etching. A spray etching system with recyclable etching solution can be designed, and the etching effect under different etching conditions can be studied by adjusting various etching parameters.
[0003] The existing invention patent CN108034946A adopts that the etching substrate is fixed in the center of the rotating shaft in a regular hexagonal shape, and the nozzle hole is moved in translation around the surrounding for spray etching. However, due to its non-stop movement, the supply and flow distribution of the etching liquid will appear uneven. The situation is extremely unfavor...