Film thickness measurement apparatus

A technology for measuring equipment and film thickness, applied in the direction of measuring devices, instruments, optical devices, etc., can solve the problems of unreliable measuring equipment, difficult to use automatic measuring system, etc., and achieve the effect of improving measurement reliability

Active Publication Date: 2011-03-30
YOKOGAWA ELECTRIC CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, measuring devices according to the prior art are unreliable and difficult to use in automatic measuring systems or automatic control systems

Method used

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  • Film thickness measurement apparatus
  • Film thickness measurement apparatus

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Embodiment Construction

[0050] The invention will be described herein with reference to the illustrated embodiments. Those skilled in the art will recognize that many alternative embodiments can be accomplished using the teachings of the present invention and that the invention is not limited to the embodiments illustrated for explanatory purposes.

[0051] first preferred embodiment

[0052] A first preferred embodiment of the present invention will be described below. figure 1 is a block diagram showing a film thickness measuring device according to a first preferred embodiment of the present invention. exist figure 1 in, with Image 6 The same reference numerals are used for the same components, and their descriptions are omitted.

[0053] The film thickness measuring device according to the first preferred embodiment of the present invention includes a reflection spectrum acquisition unit 10 and an operation unit 40 . The reflection spectrum acquisition unit 10 includes a light source 11 an...

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Abstract

A film thickness measurement apparatus may include a spectrum acquisition unit that irradiates a light onto a film and acquires a spectrum of a reflection light or a transmission light, a power spectrum calculating unit that calculates a power spectrum, a film thickness calculating unit that detects a peak position of the power spectrum and calculates a thickness of the film, a measurement quality calculating unit that calculates a measurement quality of the thickness, a measurement quality determining unit that determines whether the thickness is valid or invalid, and a film thickness outputunit that outputs the thickness if the measurement quality determining unit determines that the thickness is valid.

Description

[0001] This application claims priority from Japanese Patent Application No. 2009-188381 filed on Aug. 17, 2009, the contents of which are incorporated herein by reference. technical field [0002] The present invention generally relates to a film thickness measuring device that measures the thickness of a thin film by using light interference. More particularly, the present invention relates to a film thickness measuring device for accurately measuring the thickness of a thin film whose surface is uneven and largely scatters light. Background technique [0003] Image 6 The block diagram of shows a film thickness measurement device according to the prior art. This film thickness measuring device measures the thickness of a thin film by using light interference. Film thickness measuring devices are often used as in-line film thickness measuring instruments in film or sheet processes for the production of packaging materials or optical materials. Film thickness measuring de...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01B11/06
CPCG01B11/0633
Inventor 西田和史
Owner YOKOGAWA ELECTRIC CORP
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