Multifunctional urethane monomer, method of manufacturing the monomer and photo-sensitive resin composition including the monomer

一种酯多官能、氨基甲酸的技术，应用在氨基甲酸衍生物制备、羧酸酐制备、有机化合物的制备等方向，能够解决增加组合物粘度、光聚合引发剂价高等问题，达到好耐化学性和耐热性、优良感光性、高显影宽容度的效果

Active Publication Date: 2011-03-30
LG CHEM LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, increasing the binder content is limited by the content of the composition and has the disadvantage of increasing the viscosity of the composition
In addition, there is a disadvantage that a photopolymerization initiator having high photosensitivity is expensive

Method used

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  • Multifunctional urethane monomer, method of manufacturing the monomer and photo-sensitive resin composition including the monomer
  • Multifunctional urethane monomer, method of manufacturing the monomer and photo-sensitive resin composition including the monomer
  • Multifunctional urethane monomer, method of manufacturing the monomer and photo-sensitive resin composition including the monomer

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0058] The preparation method of alkali-soluble resin can be prepared according to the following two steps:

[0059] In the first step, monomers containing acid functional groups are copolymerized with aromatic and aliphatic vinyl monomers suitable for copolymerization to obtain alkali-soluble linear copolymers. Preferably, the aromatic and aliphatic vinyl monomers may be selected from those monomers that improve film strength. The monomer that can improve film strength may be selected from compounds having an aromatic ring.

[0060] The reaction may be carried out using a method selected from a variety of polymerization methods known in the art: free radical polymerization, cationic polymerization, anionic polymerization, polycondensation, and the like. In view of the ease of preparation and the economical effect of preparation, radical polymerization is most preferably used.

[0061] For example, it can be produced by mixing monomers with a polymerization solvent, heating ...

specific example

[0063] The free radical polymerization initiator may be selected from those known in the art, and specific examples thereof include 2,2'-azobisisobutyronitrile (AIBN), 2,2'-azobis-( 2,4-dimethylvaleronitrile), 2,2'-azobis-(4-methoxy-2,4-dimethylvaleronitrile), benzoyl peroxide, lauroyl peroxide, peroxide tert-butyl oxypivalate and 1,1'-bis-(di-tert-butylperoxy)cyclohexane, etc.

[0064] The chain transfer agent is used to control the weight average molecular weight, examples of which are: n-hexyl mercaptan, n-octyl mercaptan, n-dodecyl mercaptan, t-dodecyl mercaptan, thiol Glycolate / ester, 3-mercaptopropionic acid, α-methylstyrene dimer, etc. The chain transfer agent is not limited thereto, and may be selected from those known in the art.

[0065] Examples of monomers having acid groups that can be used to prepare the linear copolymers include: (meth)acrylic acid, crotonic acid, itaconic acid, maleic acid, fumaric acid, monomethylmaleic acid, isoprene olefin sulfonic acid, ...

Embodiment 1

[0098] 35 g of 25% carbon black dispersion, 2.5 g of the urethane polyfunctional monomer prepared in Synthesis Example 1, 12.4 g of an alkali-soluble resin (solid content: 3.5 g), 2.0 g of dipentaerythritol hexaacrylate As a polymer, 1.5 g of photopolymerization initiator OXE-02, 0.5 g of 3-{4-[2,4-bis(trichloromethyl)-s-triazin-6-yl]phenylthio}propionic acid, 0.2 g of 4,4'-bis(diethylamino)benzophenone and 44.5 g of PGMEA organic solvent were mixed with each other for 3 hours to prepare a photosensitive resin composition.

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Abstract

The present invention relates to a urethane-based multifunctional monomer, a production method for the same, and a light-sensitive resin composition comprising the same. The urethane-based multifunctional monomer is produced by means of reaction between: (a) an epoxy compound having at least 2 epoxy groups, (b) a diol compound having an acid group, and (c) a compound having an ethylenically unsaturated group and an isocyanate group. The light-sensitive resin composition comprising the urethane-based multifunctional monomer according to the present invention has a low viscosity and excellent sensitivity, and outstanding chemical resistance, heat resistance, and development latitude.

Description

technical field [0001] The invention relates to a carbamate polyfunctional monomer, a method for preparing the monomer and a photosensitive resin composition containing the monomer. More particularly, the present invention relates to a urethane polyfunctional monomer for a photopolymerizable negative photosensitive resin composition having excellent photosensitivity, heat resistance, chemical resistance and development tolerance degree (development margin). Background technique [0002] The photopolymerizable negative photosensitive resin composition is used in various applications such as color filter photoresist, overcoat photoresist, columnar spacer, photo-shielding insulating material, and the like. The composition generally contains an alkali-soluble resin, a polymer having ethylenic unsaturation, a polymerizable initiator and a solvent. [0003] The photosensitive resin composition is used in such a manner that it is coated on a substrate to form a film, a predetermi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C07C51/54
CPCC07C2103/18C07C59/285C07C269/02C07C2603/18C07C271/16C07C51/54C07C51/56
Inventor 许闰姬林敏映池昊燦金星炫金韩修金善花
Owner LG CHEM LTD
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