Method for forming contact hole and method for forming contact plug
A technology of contact hole and etching stop layer, which is applied in the formation of contact holes and contact plugs, can solve the problems of poor resistance distribution characteristics of contact plugs, and achieve the ability to improve resistance distribution characteristics and physical and chemical effects , the effect of avoiding damage
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[0038] In order to make the above objects, features and advantages of the present invention more comprehensible, specific implementations of the present invention will be described in detail below in conjunction with the accompanying drawings.
[0039] In the following description, a lot of specific details are set forth in order to fully understand the present invention, but the present invention can also be implemented in other ways different from those described here, and those skilled in the art can do it without departing from the meaning of the present invention. By analogy, the present invention is therefore not limited to the specific examples disclosed below.
[0040] Secondly, the present invention is described in detail in combination with schematic diagrams. When describing the embodiments of the present invention in detail, for the convenience of explanation, the cross-sectional view showing the device structure will not be partially enlarged according to the gener...
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