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Wafer drying system

A drying system and wafer technology, applied in drying, drying machines, progressive drying machines, etc., can solve the problems of high power consumption, easy deformation, scrapping, etc., and achieve the effect of reducing hot air temperature and wind speed

Active Publication Date: 2011-08-10
启迪微电子(芜湖)有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

As a result, the power consumption of the heater 3' for heating the gas is relatively large, usually requiring more than ten kilowatts and continuous heating
And, this causes another problem that, because the existing wafer carrier basket 21' is usually made of plastic, the wafer carrier basket 21' is easily deformed and scrapped at high temperature.

Method used

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Embodiment Construction

[0026] Embodiments of the present invention are described in detail below, examples of which are shown in the drawings, wherein the same or similar reference numerals designate the same or similar elements or elements having the same or similar functions throughout. The embodiments described below by referring to the figures are exemplary only for explaining the present invention and should not be construed as limiting the present invention.

[0027] In the description of the present invention, the orientation or positional relationship indicated by the terms "inner", "outer", "upper", "lower", "upstream", "downstream" etc. are based on the orientation or positional relationship shown in the drawings, The disclosure is merely for convenience in describing the invention and does not require that the invention must be constructed and operated in a particular orientation, and thus should not be construed as limiting the invention. In the description of the present invention, the ...

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Abstract

The invention discloses a wafer drying system, which comprises a drying chamber and a transmission unit, wherein the transmission unit is used for transmitting a wafer to pass through the drying chamber and comprises a transmission belt; an upper section of the transmission belt is used for carrying a wafer carrier; the wafer is accommodated in the wafer carrier; and two sides of the upper section of the transmission belt tilt upwards or downwards to the centre of the transmission belt. According to the wafer drying system, the wafer can be dried more efficiently and more cleanly. Furthermore, the wafer drying system can reduce power consumption, improve the utilization efficiency of the wafer carrier and prolong service life.

Description

technical field [0001] The invention relates to the technical field of wafer processing, in particular to an improved wafer drying system, especially a drying system for solar wafers. Background technique [0002] In existing wafer drying equipment, the conveyor belt used to transport wafers is generally horizontal, so that the wafers and corresponding wafer carriers can be sequentially and continuously transported and dried in the wafer drying equipment. Figure 4 A schematic diagram of an existing wafer drying apparatus 100' is shown in . Wherein, the conveyor belt 1' for transferring wafers is arranged horizontally. exist Figure 4 The wafer carrier 2' includes a cleaning frame and a wafer carrier basket 21' to accommodate the wafer 5'. A plurality of longitudinal grooves 6' are oppositely arranged on the two side walls of the commonly used wafer carrying basket 21', and the wafers 5' to be cleaned are placed in the corresponding longitudinal grooves 6'. Thus, after the...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/00H01L21/677F26B15/18
Inventor 李园
Owner 启迪微电子(芜湖)有限公司
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