Particle trap for a plasma source
一种颗粒捕集器、远程等离子源的技术,应用在等离子体、化学仪器和方法、使气体介质与气体介质反应的方法等方向,能够解决污染等离子产生器颗粒等问题,达到再组合少、生产停机时间少、高生产率的效果
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[0035] figure 1 is a schematic cross-sectional view of a plasma generation system 100 according to an exemplary embodiment of the present invention. The system 100 includes a remote plasma source 110 , a processing chamber 130 , and a particle trap 140 . The outlet 125 of the remote plasma source 110 is coupled to the inlet 135 of the particle trap 140 . In certain embodiments, outlet 125 is directly coupled to inlet 135 . In some embodiments, the outlet 125 is indirectly coupled to the inlet 135 by, for example, a pipe or other suitable structure. In the chamber 120 of the plasma source 110, for example, the plasma gas (such as O 2 , N 2 , Ar, NF 3 、H 2 and He) or a mixture of gases is applied with a sufficient potential to ionize at least a portion of the gas in chamber 120 to generate a plasma. The plasma is used to activate other gases introduced into the chamber 120 of the plasma source 110, placing the other gases in an active state such that the gases have, for e...
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