Device and method for drying supercritical carbon dioxide microemulsion

A technology of carbon dioxide and high-purity carbon dioxide, which is used in drying solid materials, drying solid materials without heating, drying, etc., can solve the problems of time-consuming and large amount of carbon dioxide, and achieves avoiding large-scale use, low viscosity coefficient, reducing The effect of energy consumption

Active Publication Date: 2013-07-31
新疆中科丝路物联科技有限公司
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in order to avoid a certain amount of organic solution or water remaining in the device structure, it is often necessary to perform repeated pulse replacement, which is not only time-consuming, but also consumes a large amount of carbon dioxide.

Method used

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  • Device and method for drying supercritical carbon dioxide microemulsion
  • Device and method for drying supercritical carbon dioxide microemulsion

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Embodiment Construction

[0030] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be described in further detail below in conjunction with specific embodiments and with reference to the accompanying drawings.

[0031] Such as figure 1 as shown, figure 1 It is a schematic diagram of a device based on supercritical carbon dioxide microemulsion drying provided by the invention, and the device includes:

[0032] The liquid storage tank 1 that is equipped with surfactant and the gas storage tank 2 that provides high-purity carbon dioxide are connected to the solenoid valve 5 through the second booster pump 3 and the first booster pump 4 respectively, and the other end of the solenoid valve 5 connected to the inlet of the reaction chamber 6;

[0033] One outlet pipeline of the reaction chamber 6 is connected to the observation window 10 through the first manual valve 9, and the other outlet pipeline is connected to the second heat e...

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Abstract

The invention discloses a device and a method for drying supercritical carbon dioxide microemulsion. The method comprises the following steps of: displacing a water-based cleaning fluid by using liquid carbon dioxide; adding a surfactant; heating the carbon dioxide to reach a supercritical state; and drying a photoresist or a microstructure in a micro-electromechanical system (MEMS). In the method, because a gas-liquid interface and the surface tension are prevented, high depth-to-width ratio or porous structures and the like can be cleaned and dried without damage. Compared with the conventional supercritical carbon dioxide drying method, the method has the advantages that: an organic solution is not required to be used, so that the photoresist and the like cannot be damaged; the drying time is greatly reduced, so that the problem of pattern collapse can be effectively solved. The method meets the requirements of reducing the consumption of the organic solution, saving energy and thelike in an international semiconductor technology blueprint, and is easily compatible with the conventional integrated circuit (IC) process.

Description

technical field [0001] The invention relates to the technical field of semiconductor cleaning and drying, in particular to a supercritical carbon dioxide (SCCO 2 ) Apparatus and method for drying microemulsion. Background technique [0002] In the manufacturing process of microelectronic devices, with the further reduction of feature size and the further increase of structure complexity, the collapse of device structure has become an increasingly serious problem. When the devices cleaned with water as the main solvent are dried, the weaker mechanical structures such as micro-electro-mechanical components and photoresist patterns with high aspect ratios will be damaged. [0003] As an environmentally friendly and cheap solvent, carbon dioxide has a supercritical state with close to zero surface tension and high diffusivity, which is very suitable for semiconductor cleaning processes, so the 2006 International Semiconductor Technology Blueprint (ITRS) will supercritical Flui...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): F26B5/16
Inventor 王磊景玉鹏
Owner 新疆中科丝路物联科技有限公司
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