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Exposure control device and method

A technology of exposure control and exposure time, applied in the field of photography, can solve the problem of inaccurate optimal exposure compensation value and achieve the effect of reducing energy consumption

Active Publication Date: 2013-11-20
SHENZHEN ADVANCE RIVER SYST TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] Although the above-mentioned patent has improved the traditional exposure control method, it seeks an optimal exposure compensation value based on the brightness value of the pixel in the digital image of the initial exposure value, and this optimal exposure compensation value does not vary with the external light environment. Therefore, the optimal exposure compensation value obtained only based on the brightness value of the digital image pixel of the initial exposure value is not accurate

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  • Exposure control device and method

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Experimental program
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Embodiment 1

[0031] see figure 1 , Embodiment 1 of the exposure control method of the present invention includes the following steps:

[0032] Step 101: Acquiring the first exposure time in the camera photometry process, the first exposure time is the current exposure time when the infrared emitting device is turned on;

[0033]When the infrared emitting device is turned on, expose the target object to obtain the current exposure time. Since the current exposure time is inversely proportional to the light intensity when the camera is imaging, that is, when the infrared emitting device is turned on, the camera imaging effect is the best. , there is an optimal exposure time, based on this optimal exposure time to determine whether the infrared light is sufficient.

[0034] Step 102: judging whether the first exposure time is greater than a second preset local threshold;

[0035] The second threshold value preset locally is the lower limit value of the first exposure time when the luminous ...

Embodiment 2

[0052] see figure 2 , Embodiment 2 of the exposure control method of the present invention, comprising the following steps:

[0053] Step 201: Acquiring the first exposure time in the photometry process, the first exposure time being the current exposure time when the infrared emitting device is turned on;

[0054] Step 202: judging whether the first exposure time is greater than a second preset local threshold;

[0055] Step 203: If the first exposure time is less than the second threshold, reduce the infrared emission intensity of the infrared emitting device;

[0056] Step 204: If the first exposure time is greater than the second threshold, then judge whether the first exposure time is greater than the third threshold preset locally;

[0057] Step 205: If the first exposure time is greater than the third threshold, increase the infrared emission intensity of the infrared emitting device to reduce the first exposure time, so that the first exposure time is greater than t...

Embodiment 3

[0059] see image 3 , Embodiment 3 of the exposure control method of the present invention, comprising the following steps:

[0060] Step 301: Acquiring the first exposure time in the photometry process, the first exposure time is the current exposure time when the infrared emitting device is turned on;

[0061] Step 302: judging whether the first exposure time is greater than a second preset local threshold;

[0062] Step 303: If the first exposure time is less than the second threshold, reduce the infrared emission intensity of the infrared emitting device;

[0063] Step 304: If the first exposure time is greater than the second threshold, then judge whether the first exposure time is greater than the third threshold preset locally;

[0064] Step 305: If the first exposure time is less than the third threshold, maintain the infrared emission intensity of the infrared emitting device;

[0065] Step 306: If the first exposure time is greater than the third threshold, increa...

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Abstract

The invention discloses an exposure control device and method. The exposure control method comprises the following steps of: reducing a working current of infrared emission equipment in a shooting photometry process, and acquiring an exposure time variation value after the working current is reduced; judging whether the ratio of the exposure time variation value to the reduced value of the working current is smaller than a first threshold value; and closing the infrared emission equipment and continuing shooting when the ratio is smaller than the first threshold value. According to the invention, infrared light can be accurately regulated according to the real-time variation of an outside light ray environment, so that the camera can be used for acquiring clear and stable images of a target under various light ray conditions.

Description

technical field [0001] The present invention relates to the technical field of imaging, in particular to an exposure control device and method. Background technique [0002] When the camera is imaging, it is very important to control the intensity of the exposure light, and the exposure parameters are generally controlled by the exposure time and aperture size. The exposure time is inversely proportional to the exposure light. The stronger the exposure light, the shorter the exposure time. Conversely, the weaker the exposure light, the longer the exposure time. The size of the aperture is inversely proportional to the intensity of the exposure light. The stronger the exposure light is, the smaller the control aperture will be. Conversely, the weaker the exposure light will be, the larger the control aperture will be. [0003] In order to realize that the camera can work normally in a dark environment, especially at night, it is obviously impossible to solve the problem only...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H04N5/235H04N5/243H04N23/76
Inventor 陈冠波
Owner SHENZHEN ADVANCE RIVER SYST TECH CO LTD