PIN (Positive Intrinsic Negative) diode and manufacturing method thereof
A technology of a PIN diode and a manufacturing method, applied to the PIN diode and its manufacturing field, can solve the problems of high cost, high reverse isolation, and the PIN diode cannot be integrated with CMOS in the same chip at the same time.
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[0050] The first embodiment of the PIN diode of the present invention is as Figure 9 As shown, it includes a substrate 1, an N-type cathode 11, an intrinsic semiconductor 12, a P-type anode 13, an isolation region 14, and an N-type extrinsic base region cathode 111. A disc-shaped N-type cathode 11 is formed above the substrate 1. An intrinsic semiconductor 12 is grown above the middle part of the sheet-shaped N-type cathode 11, and an annular N-type extrinsic base cathode coaxial with the disk-shaped N-type cathode 11 is formed above the peripheral part of the sheet-shaped N-type cathode 11. 111, the periphery of the intrinsic semiconductor 12 close to the end of the N-type cathode 11 is in contact with the annular N-type extrinsic base region cathode 111; A disc-shaped P-type anode 13 coaxial with the disc-shaped N-type cathode 11, the intrinsic semiconductor 12 is away from the periphery of the N-type cathode 11 end and between the periphery of the disc-shaped P-type anode ...
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