Exposure device and exposure method
A technology of an exposure device and an exposure method, which is applied in the exposure field, can solve the problems of low light transmittance, the pattern cannot conform to the pattern, and the performance of electronic products is limited, and achieves the effect of improving the performance and reducing the line spacing of the pattern.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0026] The following descriptions of the various embodiments refer to the accompanying drawings to illustrate specific embodiments in which the invention may be practiced. The directional terms mentioned in the present invention, such as "up", "down", "front", "back", "left", "right", "inside", "outside", "side", etc., are for reference only The orientation of the attached schema. Therefore, the directional terms used are for explaining and understanding the present invention, but not for limiting the present invention.
[0027] In the figures, structurally similar units are denoted by the same reference numerals.
[0028] Please refer to figure 1 , which shows a schematic diagram of an exposure apparatus according to a first embodiment of the present invention. The exposure device 100 of this embodiment is used for exposing the photoresist layer 102 on the transparent substrate 101 to pattern the photoresist layer 102 . Wherein, the transparent substrate 101 is, for examp...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com