Novel trench isolation groove for filling trench

A new technology of trench isolation, used in measuring devices, instruments, fluid velocity measurement, etc., can solve problems such as incomplete filling

Active Publication Date: 2012-08-08
XI AN ZHISENSOR TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The purpose of the present invention is: in order to solve the problem of incomplete filling of the existing surface rectangular trench filling, the pres

Method used

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  • Novel trench isolation groove for filling trench
  • Novel trench isolation groove for filling trench
  • Novel trench isolation groove for filling trench

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0025] refer to figure 2 , the trench isolation groove in this embodiment, the inner wall of the groove is a right-angled corner, the corner of the outer wall is rounded, and the rounded corner is formed with the right-angled corner of the inner wall as the center and a radius of 2 μm. arc line.

[0026] Of course, as a development of this embodiment, the inner wall of the groove is a right-angled corner, the corner of the outer wall is rounded, and the rounded corner is an arc formed by taking the right-angled corner of the inner wall as the center of the circle and having a radius of less than 2 μm. Line, and tangent to the outer wall, is also an implementation that satisfies the technical features of the present invention.

Embodiment 2

[0028] refer to image 3 : the channel isolation groove in the present embodiment, the inner wall of the groove is a right-angled corner, and the outer wall corner is a half-side chamfer, that is, the outer wall corner is a slash that is 45° with the two sides of the outer wall; The vertical distance between the line and the right-angled corner of the inner wall is 2 μm.

[0029] Of course, as a development of this embodiment, the inner wall of the groove is a right-angled corner, and the vertical distance between the oblique line of the outer wall corner and the right-angled corner of the inner wall is less than 2 μm, which is also an implementation that satisfies the technical features of the present invention.

Embodiment 3

[0031] refer to Figure 4 : In the trench isolation groove in the present embodiment, the inner wall surface and the outer wall surface corners of the groove are half chamfered, and the two chamfered lines are parallel lines with a distance of 2 μm, and the chamfered lines and the two sides of the outer wall surface are all 45° angle.

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Abstract

The invention discloses a novel trench isolation groove for filling a trench and belongs to a micro electro mechanical system (MEMS) and a micro processing technology. According to the trench isolation groove provided by the invention, the distance between any point on the inner wall surface and the outer wall surface is respectively not greater than d, wherein the d is the width of the trench isolation groove. The trench isolation groove meeting the technical characteristics has diversified forms. The invention provides a plurality of specific embodiments. The corner shape of the trench isolation groove is directly changed, and thus the phenomenon that a small unfilled part at the corner of a rectangular groove appears is avoided and the groove corner can be ensured to be completely filled. Although etching ions rebound from the bottom surface to cause secondary etching on the side wall, the corner of the rectangular trench is of a circular arc and the like; and the distance between the inner wall surface and the outer wall surface is smaller than or equal to 2mu m and is equal to the distance between the two sides of the rectangular groove, so that no clearance in filling is ensured.

Description

[0001] Field: [0002] The invention mainly belongs to micro-electromechanical system (MEMS) and micro-machining technology, and specifically relates to the special shape of a rectangular channel isolation groove at a right-angle corner. Background technique: [0003] In MEMS technology, there are often situations where device surfaces need not only mechanical connection but also electrical isolation. Existing methods are usually realized by trench isolation trenches with a rectangular cross-section. In the trench isolation trenches, corresponding trenches are first etched on the device, and then a layer of silicon dioxide is grown on both side walls of the trenches as The insulating layer, which is filled with polysilicon material, plays the role of mechanical connection of the isolated part of the device surface. However, since the width of the rectangular groove at the right-angled corner is larger than that at the parallel part, such a trench isolation trench with a recta...

Claims

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Application Information

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IPC IPC(8): B81B7/00
Inventor 乔大勇史龙飞刘耀波康宝鹏杨璇梁晓伟夏长峰
Owner XI AN ZHISENSOR TECH CO LTD
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