UV-LIGA (Ultraviolet-Lithografie, Galvanoformung, Abformung) method for manufacturing multi layers of mini-type inductance coils on silicon substrate
A UV-LIGA and micro-inductance technology, which is applied in the manufacture of circuits, electrical components, semiconductors/solid-state devices, etc., can solve the problems of affecting the electrical performance of coils, low cost performance, and long manufacturing cycle of photographic substrates, so as to achieve high production efficiency and high production efficiency. Ease of design and shortened preparation time
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[0030] Detailed description of the specific implementation of the present invention in conjunction with the accompanying drawings and technical solutions
[0031] Process flow of the present invention is roughly as figure 1 As shown, the specific steps are as follows:
[0032] 1) According to the shape, size and layout of the designed inductance coil, draw the mask pattern and make the mask plate of each layer of the coil. Select the chrome plate. The two negative masks are used for the positive resist lithography in the sputtering stage and the negative resist lithography in the electroforming stage (the photosensitive properties of the positive and negative photoresists are opposite). The wire posts between the coils and the insulating layer are used as the seed layer, so only the negative mask is needed for the negative photolithography in the electroforming stage;
[0033] 2) Choose a three-inch Si sheet with a thickness of 200 μm as the substrate. First, clean the Si su...
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