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Protection device for leak of workpiece platform

A technology of water leakage protection and workpiece table, which is applied in the direction of photolithographic exposure device, electrical components, semiconductor/solid-state device manufacturing, etc., can solve the problems of water leakage of micro-motion table and damage of micro-motion table, and achieve simple structure, few sensors, Ease of detection and control of effects

Inactive Publication Date: 2012-10-17
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
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AI Technical Summary

Problems solved by technology

[0003] The technical problem to be solved by the present invention is to provide a water leakage protection device for the workpiece table to solve the problem that the workpiece table in the prior art cannot detect the water leakage of the micro-motion table sensitively and effectively prevent the water leakage from causing damage to the micro-motion table

Method used

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  • Protection device for leak of workpiece platform
  • Protection device for leak of workpiece platform
  • Protection device for leak of workpiece platform

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Embodiment Construction

[0017] In order to make the above objects, features and advantages of the present invention more obvious and comprehensible, specific implementations of the present invention will be described in detail below.

[0018] The workpiece platform water leakage protection device described in the present invention can be realized in various alternative ways, and the following is illustrated by a preferred embodiment. Of course, the present invention is not limited to this specific embodiment. Known general substitutions are undoubtedly covered by the protection scope of the present invention.

[0019] Please see figure 2 , figure 2 It is a schematic structural view of the workpiece platform water leakage protection device of the present invention, as figure 2 As shown, in the workpiece platform water leakage protection device of the present invention, the workpiece platform includes: a base plate 10, a motor mounting seat 11, a cooling water pipe 12, a cooling water connector 13...

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Abstract

The invention provides a protection device for leak of workpiece platforms comprising: a bottom plate, a cooling water pipe arranged on the bottom plate, a joint of cooling water and an electric assembly. The protection device for leak includes a leak protective groove mounted on one side of the bottom plate, wherein the cooling water pipe, the joint of cooling water and the electric assembly which needs to perform leak protection are mounted on the side of the bottom plate. Waterproof materials are pasted on the bottom and the side of the leak protection groove. The protection device for leak of workpiece platforms in the invention can design the distribution of the leak protection groove in the bottom plate of a micropositioner based on the needs and realize full-range protection to the bottom plate of the micropositioner. Leak is collected at a position of the leak protection groove for detection and the protection device has a simple structure and few used sensors. The device is convenient for detection and control and saves the cost.

Description

technical field [0001] The invention relates to the technical field of semiconductor manufacturing equipment, in particular to a water leakage protection device for a workpiece table. Background technique [0002] In large-scale integrated circuit production equipment, especially in lithography machines, the integration of various devices is relatively high, including the layout of water, electricity and other pipelines, especially in the micro-motion table of lithography machines. Please see figure 1 , figure 1 It is a structural schematic diagram of a micro-movement stage of a lithography machine in the prior art. Such as figure 1 As shown, there are motor mounts 11 , cooling water pipes 12 , cooling water connectors 13 , electrical connectors 14 , and electrical cables 15 distributed on the bottom plate of the micro-motion stage 10 . Due to the improvement of the efficiency of the lithography machine, the acceleration and speed of the movement of the micro-motion tabl...

Claims

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Application Information

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IPC IPC(8): G03F7/20H01L21/00
Inventor 范哲光齐芊枫
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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