Silicon wafer cleaning device and liquid storage pot

Abstract

The embodiment of the invention discloses a liquid storage pot, which comprises a main pot body and a liquid display pipe, wherein an opening is arranged at one end of the liquid display pipe, and the other end of the liquid display pipe is communicated with the main pot body; and a capsule which can be totally or partially unfolded and can separate the liquid display pipe and the main pot body is arranged between the liquid display pipe and the main pot body. The capsule which can be unfolded is arranged between the main pot body and the liquid display pipe and separates the main pot body and the liquid display pipe into two parts. When the height of a chemical agent in the main pot body needs to be observed, to-be-measured liquid is injected at the opening of the liquid display pipe; when the height of the chemical agent in the main pot body changes, the capsule is unfolded or closed, the to-be-measured liquid in the liquid display pipe changes immediately. As different liquid can be respectively injected to the main pot body and the liquid display pipe in the liquid storage pot, and to-be-measured liquid which is easy to distinguish and clean can be injected in the liquid display pipe, so that the phenomenon that pollutant is easy to generate as the liquid display pipe and the main pot body adopt the same liquid can be avoided. The embodiment of the invention also provides a silicon wafer cleaning device.

Description

technical field [0001] The invention relates to the technical field of semiconductors, and more specifically, to silicon wafer cleaning equipment and a liquid storage tank. Background technique [0002] As the critical dimensions of silicon wafers continue to shrink, the surface of silicon wafers must be clean before undergoing processing. The most effective way to control contamination is to prevent contamination of silicon wafers. Among them, the dominant method of cleaning the surface of silicon wafers is wet chemical method. Dirt is peeled off from the surface of the silicon wafer to achieve the purpose of cleaning. [0003] The traditional wet chemical method is carried out in the cleaning tank, which consists of a series of acid tanks and cleaning tanks installed in the fume hood, where the acid tanks and cleaning tanks are collectively called liquid storage tanks. In order to observe the height of the chemical agent in the storage tank conveniently, such as figure ...

AI Technical Summary

Problems solved by technology

But, because the chemical agent 14 and the display tube 12 in the liquid storage tank 11 are usually in a transparent state, it is difficult to distinguish the actual height of the chemical agent 14 by naked eyes.

And the liquid in the liquid display tube 12 is the same as the liquid in the liquid storage tank 11, often there are contaminants such as sediment to produce, and these contaminants are easy to be attached on the liquid display tube 12, because the sight line is blocked by the contaminants on the one hand , the actual liquid level height in the liquid display tube 12 cannot be observed by the naked eye.

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