Device and method for preventing water drops from being condensed on mechanical arm

Abstract

The invention discloses a device for preventing water drops from being condensed on a mechanical arm, and the device comprises a venturi tube gas boosting sprayer, wherein the venturi tube gas boosting sprayer is arranged on the mechanical arm and provided with a gas flow channel with a shrinking section, gas flowing into the venturi tube gas boosting sprayer is accelerated and then sprayed to the mechanical arm. In addition, the invention further discloses a method for preventing the water drops from being condensed on the mechanical arm. As the venturi tube gas boosting sprayer internally provided with the gas flow channel with the suddenly shrinking section is additionally arranged above the mechanical arm, the lower speed gas from a high efficiency air filter in a workshop can be accelerated by a venturi principle, and then sprayed onto the mechanical arm, and water vapor on the mechanical arm can be blown away without adding power equipment, thereby preventing the water drops from being condensed on the mechanical arm and saving energy effectively.

Description

technical field [0001] The invention relates to a device and method for preventing water droplets from condensing on a mechanical arm. Background technique [0002] Currently, in a semiconductor process shop, robotic arms are often required to move wafer boats from one process tank to another. These process tanks are arranged in the shop and contain the required chemical reagents, such as temperature Phosphates up to 165 degrees Celsius. Generally, the wafer boat is placed on an object carrier, and the carrier board is hung on the laterally arranged robotic arm through two hooks. By moving the robotic arm, the carrier plate hung under the robotic arm and the wafer boat on it are moved, and finally the wafers placed in the wafer boat are transported. [0003] However, in use, it is found that, due to the relatively high temperature of the chemical reagent in the process tank, the water vapor volatilized from the chemical reagent is easily stained on the surface of the robot...

AI Technical Summary

Problems solved by technology

[0003] However, in use, it is found that due to the relatively high temperature of the chemical reagents in the process tank, the water vapor volatilized by the chemical reagents is easy to stick to the surface of the mechanical arm and gradually form water droplets

Once the mechanical arm vibrates or impacts greatly during the movement, these water droplets are easily thrown onto the wafers in the wafer boat, thereby contaminating the wafers and seriously affecting the product yield.

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