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Lithographic apparatus, substrate table and device manufacturing method

A substrate table and substrate technology, applied in the field of manufacturing devices, can solve problems such as deformation, calculation errors, hindrances to miniaturization and the use of multiple detectors

Inactive Publication Date: 2013-03-06
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The pre-amplifier generates heat which can lead to deformation of the alignment sensor grating and finally to calculation errors of the aligned position
In addition, the photodetectors and electronics form a bulky structure (which also hinders miniaturization and the use of multiple detectors) and require special alignment within the sensor

Method used

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  • Lithographic apparatus, substrate table and device manufacturing method
  • Lithographic apparatus, substrate table and device manufacturing method
  • Lithographic apparatus, substrate table and device manufacturing method

Examples

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Embodiment Construction

[0044] figure 1 A lithographic apparatus 100 comprising a source collector module SO according to an embodiment of the present invention is schematically shown. The lithographic apparatus comprises: an illumination system (illuminator) IL configured to condition a radiation beam B (e.g. EUV radiation); a support structure (e.g. a mask table) MT configured to support a patterning device (e.g. A mask or reticle) MA, and is connected to a first positioning device PM configured to accurately position the patterning device MA; a substrate table (such as a wafer stage) WT, which is configured to hold a substrate (such as coated with Resist wafer) W, and is connected with the second positioning device PW that is configured to accurately position substrate W; The pattern of beam B is projected onto a target portion C of substrate W (eg, comprising one or more dies).

[0045] The illumination system may include various types of optical components, such as refractive, reflective, magn...

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Abstract

The present invention relates to a LITHOGRAPHIC APPARATUS, a SUBSTRATE TABLE AND a DEVICE MANUFACTURING METHOD. The substrate table with a sensor that includes a block of material provided with a layer of material opaque to radiation. The layer of material has at least one window configured to allow the transmission of the radiation. The sensor includes a wavelength conversion material located at the window, and a waveguide positioned to receive radiation emitted by the wavelength conversion material. The waveguide is embedded in the block of material and configured to guide radiation emitted by the wavelength conversion material through the block of material and towards a detector.

Description

technical field [0001] The invention relates to a lithographic apparatus, a substrate table and a method for manufacturing a device. Background technique [0002] A lithographic apparatus is a machine that applies a desired pattern to a substrate, usually a target portion of the substrate. For example, lithographic equipment may be used in the manufacture of integrated circuits (ICs). In this case, a patterning device, alternatively referred to as a mask or reticle, may be used to generate the circuit pattern to be formed on the individual layers of the IC. The pattern can be transferred onto a target portion (eg, comprising a portion, one or more dies) on a substrate (eg, a silicon wafer). Typically, the pattern is transferred by imaging the pattern onto a layer of radiation sensitive material (resist) provided on the substrate. Typically, a single substrate will contain a network of adjacent target portions that are successively patterned. [0003] Photolithography is ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20G03F9/00
CPCG03F9/7015G03F9/7088G03F7/7085G03F7/70575G03F9/7046G03F7/70
Inventor V・普洛斯因特索夫J・M・范本特恩
Owner ASML NETHERLANDS BV
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