Radiation-free paster fabric

A radiation patch and fabric technology, applied in the field of fabrics and textile fabrics, can solve the problems of unsatisfactory people, poor layering, and unavoidable radiation, and achieve the effects of enhancing warmth retention, enhancing layering, and avoiding radiation

Inactive Publication Date: 2013-04-10
周忠平
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] Traditional fabrics have a single structure and poor layering, which cannot meet people's needs
and cannot avoid radiation

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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  • Radiation-free paster fabric
  • Radiation-free paster fabric

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0018] see figure 1 and figure 2 , The present invention relates to a radiation-free patch fabric, comprising a fabric body 1, and a jacquard layer 2 is provided on the upper surface of the fabric body 1. The upper surface of the jacquard layer 2 is provided with a patch layer 3, and the patch layer 3 includes several patches 31, and the patches 31 overlap each other and are fixed on the fabric body 1, such as figure 2 As shown, the patches 31 overlap to form a tree branch pattern. The lower surface of the fabric body 1 is provided with a fluff layer 4, the fluff layer 4 fluffs on the lower surface of the fabric body 1, and the back side of the fluff layer 4 is compounded with a wave-absorbing layer 5, and the wave-absorbing layer 5 and the fluff The layers 4 are fixed by adhesive 6 .

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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PUM

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Abstract

The invention relates to a radiation-resisting paster fabric, belonging to the field of textile fabrics and comprising a fabric body (1), wherein a jacquard layer (2) is arranged on the upper surface of the fabric body (1), a paster layer (3) is arranged on the upper surface of the jacquard layer (2) and comprises a plurality of pasters (31) which are mutually lap-jointed and are fixed on the fabric body (1), a napping layer (4) is arranged on the lower surface of the fabric body (1) and is napped from the lower surface of the fabric body (1), a wave absorbing layer (5) is compounded on the back surface of the napping layer (4), and the wave absorbing layer (5) and the fabric body (1) are fixed by using an adhesive (6). Due to the adoption of the paster layer and the jacquard layer, the layering effect of the paster fabric is enhanced; and due to the adoption of the napping layer, the warm keeping property of the paster fabric is improved. The paster fabric is capable of resisting radiation.

Description

(1) Technical field [0001] The invention relates to a fabric and belongs to the field of textile fabrics. (2) Background technology [0002] Traditional fabrics have a single structure and poor layering, which cannot meet people's needs. And radiation cannot be avoided. (3) Contents of the invention [0003] The object of the present invention is to overcome the above disadvantages and provide a patch fabric with a strong sense of layering and no radiation. [0004] The purpose of the present invention is achieved in this way: a radiation-free patch fabric includes a fabric body, the upper surface of the fabric body is provided with a jacquard layer, the upper surface of the jacquard layer is provided with a patch layer, and the patch The layer includes several patches, and the patches overlap each other and are fixed on the fabric body. The lower surface of the fabric body is provided with a fluff layer, and the fluff layer is fluffed on the lower surface of the fabric ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B32B5/26D06Q1/00
Inventor 周忠平
Owner 周忠平
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