Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Scrubbing tower used for acidic and alkaline exhaust gas of semiconductor plants

A washing tower, acid-base technology, applied in the field of washing towers, can solve the problems of level gauge float stuck, unfavorable environment, unable to correctly react liquid level, etc., and achieve the effect of excellent treatment effect and simple structure.

Inactive Publication Date: 2013-05-08
CSMC TECH FAB2 CO LTD
View PDF5 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The washing towers of most factories are installed outdoors. After long-term operation, there will be a lot of sundries in the detergent in the washing towers
In addition, in order to increase the processing efficiency of the scrubber, the scrubber is usually equipped with fillers, which will become brittle and broken after long-term work
If the above-mentioned sundries and broken fillers enter the liquid level gauge and are not disposed of in time, it may cause the floating ball of the liquid level gauge to get stuck, which will cause the liquid level gauge to fail to correctly reflect the liquid level of the detergent in the washing tower.
The consequence is that if the liquid level is too low and the water cannot be replenished in time, it will seriously affect the washing effect of the scrubber, which in turn will have an adverse impact on the environment

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Scrubbing tower used for acidic and alkaline exhaust gas of semiconductor plants
  • Scrubbing tower used for acidic and alkaline exhaust gas of semiconductor plants

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0023] In the following description, numerous specific details are given in order to provide a more thorough understanding of the present invention. It will be apparent, however, to one skilled in the art that the present invention may be practiced without one or more of these details. In other examples, some technical features known in the art are not described in order to avoid confusion with the present invention.

[0024] In order to provide a thorough understanding of the present invention, the detailed structure will be set forth in the following description. It is evident that the practice of the invention is not limited to specific details familiar to those skilled in the art. Preferred embodiments of the present invention are described in detail below, however, the present invention may have other embodiments besides these detailed descriptions.

[0025] figure 1 It is a schematic diagram of a scrubber for acid-base exhaust of a semiconductor plant according to an ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a scrubbing tower used for acidic and alkaline exhaust gas of semiconductor plants. The scrubbing tower comprises a circulation detergent box. A porous separation plate is arranged at the middle of the circulation detergent box. The part of the circulation detergent box below the separation plate is used for collecting a detergent. A filling material used for increasing the contact area between the acidic and alkaline exhaust gas and the detergent is arranged on the separation plate. The scrubbing tower also comprises a circulation pump and a circulation pipeline. The circulation pump is connected with the circulation detergent box through the circulation pipeline, and is used for driving the circulation flow of the detergent. The scrubbing tower also comprises a liquidometer which is arranged on the lower part of the circulation detergent box and is connected with the circulation detergent box through a connection device. A filtering device is arranged on the connection device. With the scrubbing tower provided by the invention, impurities and scraps of filling materials can be effectively prevented from entering the liquidometer and damaging the liquidometer; and scrubbing tower scrubbing effect is prevented from being affected by excessively low liquid level in the scrubbing tower. The scrubbing tower has a simple structure, and provides an excellent processing effect upon semiconductor plant acidic and alkaline exhaust gases.

Description

technical field [0001] The invention relates to the field of semiconductors, in particular to a washing tower for acid-base exhaust of semiconductor workshops. Background technique [0002] The gas discharged from the process exhaust system of clean rooms such as semiconductor factories is usually acidic and alkaline. If it is directly discharged into the environment, it will cause pollution. Therefore, a scrubber will be used to treat the acidic and alkaline exhaust. When the acid-base exhaust gas passes through the scrubber, it will chemically react with the detergent in it to remove the contained acid-base components. [0003] The replenishment and drainage of the detergent liquid level in the washing tower are all controlled by the liquid level gauge. The washing towers of most factories are installed outdoors. After long-term operation, there will be a lot of sundries in the detergent in the washing towers. In addition, in order to increase the treatment efficiency of...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): B01D53/78B01D53/40B01D53/42
Inventor 庄建春
Owner CSMC TECH FAB2 CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products