Method for cleaning silicon substrate and method for manufacturing solar cell
A cleaning method and silicon substrate technology, which is applied in semiconductor/solid-state device manufacturing, circuits, photovoltaic power generation, etc., can solve problems such as difficulty in obtaining solar cell characteristics, and achieve high photoelectric conversion efficiency
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[0034] The inventors of the present invention have intensively studied the method of Patent Document 2 in order to obtain a solar cell with high photoelectric conversion efficiency. An example of a state in which pores are formed in a silicon substrate using a metal catalyst as in the method of Patent Document 2 is shown in figure 1 . figure 1 It is an image showing the SEM (Scanning Electron Microscope) observation result of the hole 102a formed in the silicon substrate 103 using the metal catalyst 101, (a) is a plan view of the surface of the silicon substrate 103, (b) is an enlarged plan view of the hole 102a, (c ) is a sectional view of the hole 102a, and (d) is a sectional view of the internally curved hole 102a (cited by Non-Patent Document 1).
[0035] figure 2 It is a schematic diagram for explaining the formation process of the porous layer on the surface of a silicon substrate using a metal catalyst. When the silicon substrate 3 is immersed in a mixed aqueous sol...
Embodiment 1
[0127] In the solar cell of Example 1, in step S109 , the silicon substrate was immersed in ozone water having a concentration of 5 ppm at room temperature for 3 minutes to perform ozone water treatment. When producing ozone water, nitrogen is used in addition to oxygen as a raw material of ozone gas. The processing of step S109 for other solar cells will be described later.
[0128] In step S110, the excess substance used in step S109 is removed from the silicon substrate by washing the silicon substrate with water.
[0129] In step S111, use HF (50wt%): H 2 The HF aqueous solution of O=1:100 (volume ratio) removes the oxide film formed on the surface of the silicon substrate in step S109.
[0130] In step S112, the excess substance used in step S111 is removed from the silicon substrate by washing the silicon substrate with water.
[0131]In step S113, the silicon substrate is dried, and the texture formation and cleaning of the silicon substrate are completed. After tha...
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