Preparation method of photoetching developing liquid

A developing solution and photo-etching technology, applied in the field of developing solution preparation, can solve the problems of swelling and dissolving disconnection, small Array array, unsuitable application of a single TMAH solution, etc., and achieves low manufacturing price, elimination of adverse effects, and easy preparation. and the effect of industrial application

Inactive Publication Date: 2013-07-10
HEFEI GELINDA ELECTRONICS MATERIAL
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  • Claims
  • Application Information

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Problems solved by technology

With the further improvement of TFT-LCD's requirements for resolution and definition, the line width of the Array array is getting smaller and smaller, and the swelling and dissolution of the photoresist in the non-exposed area by TMAH will cause problems such as disconnection
Therefore, a single TMAH solution is not suitable for applications requiring further refinement of line width

Method used

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  • Preparation method of photoetching developing liquid

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preparation example Construction

[0020] The preparation method of photoetching developing solution of the present invention comprises the following steps:

[0021] The first step, refining and mixing: absorb the refined trimethylamine and triethylamine with methanol polar solvent, and add them to the reaction kettle according to the set ratio. The amount of trimethylamine and triethylamine can be added in the following ratio: molar ratio triethylamine: trimethylamine = 0.10-0.50:1. The preferred molar ratio of triethylamine: trimethylamine = 0.10-0.20:1. Dimethyl carbonate is added to the reactor after being refined by rectification. The amount of dimethyl carbonate added is: molar ratio trimethylamine: dimethyl carbonate = 0.7-1.4:1. The preferred molar ratio of trimethylamine: dimethyl carbonate = 0.9-1.3:1.

[0022] The second step, synthesis: the above solution is fully mixed in the autoclave. Replace the air with nitrogen, pressurize, confirm the system pressure, and control the reaction system press...

Embodiment 1

[0035] 0.5 moles of triethylamine and 1 mole of trimethylamine were respectively refined, and dissolved in 2.8 moles of refined methanol, added to the autoclave, and then 1 mole of dimethyl carbonate was added to the autoclave, replaced with nitrogen, at 110 °C, the pressure was 1.2MPa and reacted for 8 hours. The reaction conversion was 98% based on dimethyl carbonate. The intermediate obtained by the reaction was distilled under reduced pressure to remove most of the methanol, and then an excess of high-purity water was added to carry out hydrolysis at 68 degrees Celsius. During the hydrolysis, part of the water and methanol were distilled out, and after condensation, the product was refined and returned to the methanol storage tank. The hydrolyzed salt is refined and sent to the electrolysis process. The electrolysis temperature of the electrolyzer is 70 degrees Celsius, and the current density is 500A / m 2 , The concentration of the product obtained by electrolysis is 20%...

Embodiment 2

[0037] The mixture of 0.1 mole of triethylamine and 1 mole of trimethylamine is refined, dissolved in 2.8 moles of refined methanol, and added to the autoclave. Add 0.8 mole of dimethyl carbonate and 0.2 mole of diethyl carbonate to the autoclave, replace with nitrogen, and react for 4 hours at 130° C. under a pressure of 3 MPa. The reaction conversion rate is 99.11% based on dimethyl carbonate. The intermediate obtained from the reaction was distilled under reduced pressure to remove most of the methanol, and then an excess of high-purity water was added for hydrolysis (at a temperature of 72 degrees Celsius). During the hydrolysis, part of the water and methanol were distilled out, condensed and refined back to the methanol storage tank. The hydrolyzed salt is refined and sent to the electrolysis process. The electrolysis temperature of the electrolyzer is 65 degrees Celsius, and the current density is 5000A / m 2 , The concentration of the product obtained by electrolysis i...

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Abstract

The invention discloses a preparation method of a photoetching developing liquid, and the preparation method is characterized in that tetramethyl-ammonium and triethyl-monomethyl-ammonium carbonate monomethyl ester mixture midbody are synthesized by mixing trimethylamine, triethylamine and methyl-carbonate according to a given ratio. The tetramethylammonium hydroxide and triethyl-monomethyl ammonium hydroxide mixed ammonium developing solution can be finally prepared through the procedures such as hydrolysis, purification and electrolysis. Meanwhile, alkyl ammonium hydroxide aqueous solution of the alkyl structure can be obtained by adding diethyl carbonate. The prepared alkyl ammonium hydroxide mixed ammonium developing solution of different chain length structures is low in production prices, simple in process, low in metal content and applicable to the developing requirement of a short wavelength light source technology with a fine precision narrow line.

Description

technical field [0001] The invention relates to a method for preparing a developing solution used in a narrow-linewidth photoresist developing process in integrated circuits (IC) and thin film transistor liquid crystal displays (TFT-LCD), and the developing solution can be used for ultraviolet positive photoresist And chemically amplified photoresist and other occasions. Background technique [0002] The photoresist etching technology that uses photoresist coating, photomask mask and then development and etching to obtain the required pattern is widely used in the field of microelectronics manufacturing such as integrated circuits and TFT-LCD. At present, the most widely used organic alkali developer is tetramethylammonium hydroxide (TMAH) to overcome the problem of short circuit caused by the introduction of metal ions by inorganic alkali. Taking the development of a common UV positive photoresist as an example, the mechanism of development is: the photoresist sensitizer p...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/32
Inventor 徐雅玲黄源尹云舰
Owner HEFEI GELINDA ELECTRONICS MATERIAL
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