Apparatus for etching substrates
An etching and substrate technology, applied in optics, instruments, electrical components, etc., can solve the problems of workers entering the etching chamber, troublesome, complicated processes, etc.
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[0033] Hereinafter, exemplary embodiments of an apparatus for etching a substrate according to the present invention having the foregoing problems, solutions, and effects will be described in detail with reference to the accompanying drawings.
[0034] Here, the size, shape, etc. of elements shown in the drawings may be exaggerated for clarity and convenience of illustration. Also, the terms defined in particular consideration of the configuration and operation of the present invention may vary depending on user's or operator's intention or custom. In addition, such terms must be defined based on the content throughout this specification.
[0035] image 3 is a perspective view of an apparatus for etching a substrate according to an exemplary embodiment. Such as image 3 As shown, the apparatus for etching a substrate according to this exemplary embodiment includes an etching chamber 30 , a box 20 placed in the etching chamber 30 , and an ejection device 10 placed in the et...
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