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A positioning device and positioning method for a diffraction hole

A positioning device and hole positioning technology, applied in the field of optical testing, can solve problems such as labor-intensive and time-consuming, difficult diffracted light intensity, etc.

Inactive Publication Date: 2015-08-26
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in the actual installation and adjustment, how to locate the diffraction spot near the diffraction hole with a diameter of 2-3 μm, so that the detector can observe the intensity of the diffraction light is quite difficult, which is quite laborious and time-consuming

Method used

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  • A positioning device and positioning method for a diffraction hole
  • A positioning device and positioning method for a diffraction hole
  • A positioning device and positioning method for a diffraction hole

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Embodiment Construction

[0030] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be described in further detail below in conjunction with specific embodiments and with reference to the accompanying drawings.

[0031] figure 1 It is a schematic diagram of the positioning device for the diffraction hole of the present invention, including an incident light beam 101, a condenser lens 102, a diffraction plate 103, a detector 104, a computer 105 and an adjustment mechanism 106, wherein: between the condenser lens 102 and the detector 104 Place the diffraction plate 103, the incident light beam 101 forms a focus spot 301 on the diffraction plate 103 after passing through the condenser lens 102, if the focus spot 301 falls on the light-transmitting area of ​​the diffraction plate 103, a diffraction spot is formed on the detector 104; the adjustment mechanism 106 is connected with the diffraction plate 103, and the diffraction plate 10...

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Abstract

The invention discloses a positioning device and a positioning method of a diffraction hole. The positioning device comprises a focus lens, a diffraction plate, a detector, a computer and an adjustment mechanism, wherein the diffraction plate is arranged between the focus lens and the detector, incident beams form focus spots on the diffraction plate after passing through the focus lens, and if the focus spots are within a light-pervious area of the diffraction plate, diffraction spots form on the detector; the adjustment mechanism is connected with the diffraction plate which is installed on the adjustment mechanism, the adjustment mechanism makes the diffraction plate move in the X-axis direction, the Y-axis direction and the Z-axis direction of a coordinate system of the adjustment mechanism and revolve around the Z-axis, and sizes of the focus spots are adjusted so that positioning of the diffraction hole can be achieved; the computer is connected with the detector, and the computer obtains luminous intensity signals of the diffraction spots from the detector so as to display luminous intensity distribution information on the detector.

Description

technical field [0001] The invention belongs to the field of optical testing, and relates to a positioning device and a positioning method for a diffraction hole in a point diffraction interferometer. Background technique [0002] The point-diffraction interferometer uses the diffraction of small holes on the diffraction plate to generate standard spherical waves, which avoids the detection error caused by the processing error of the standard sphere and improves the detection accuracy. However, when the detection platform is built, if there is an alignment error between the focus spot of the incident beam and the center of the diffraction pinhole, the light intensity transmittance will be reduced, an asymmetric error will be introduced, and the detection accuracy will be reduced. However, in engineering applications, it is very difficult to align the focus spot with the pinhole center of 2 μm to 3 μm. [0003] In 1997, Kenneth A. Goldberg first proposed the method of using ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01B9/02
Inventor 徐富超许嘉俊邢廷文
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI