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Crystal boat automatic purge device

An automatic and crystal boat technology, applied in the direction of cleaning methods, cleaning methods and utensils, chemical instruments and methods using gas flow, etc., can solve the problems of low product yield, high production cost, transporting quartz parts, etc. efficiency, reducing production costs

Active Publication Date: 2015-08-05
SHANGHAI HUALI MICROELECTRONICS CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this method relies on manual work. During the purging process, the equipment must be downtime, and it is also necessary to manually move the quartz parts.
Therefore, the production cost of the product is higher and the yield rate of the product is lower

Method used

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  • Crystal boat automatic purge device
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Embodiment Construction

[0016] The following describes the implementation of the present invention in detail with the drawings and embodiments, so as to fully understand and implement the implementation process of how the present invention uses technical means to solve technical problems and achieve technical effects.

[0017] In the following embodiments of the present invention, the wafer boat automatic purging device is arranged in the loading area in the furnace tube, including: nozzles, guide rails, and purging control structures. The nozzles are used for spraying and purging others to remove residues in the wafer boat tank. The function of automatic cleaning, in the cleaning process, the nozzle can travel along the guide rail; the blowing control structure is used to control the blowing state of the nozzle. This solution automatically realizes the cleaning of residues, avoids manual shutdown and cleaning in the prior art, thereby reducing the production cost of the product and improving the yield o...

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Abstract

The invention discloses an automatic wafer boat purging device and belongs to the technical field of semiconductors. The automatic wafer boat purging device is arranged in a loading area inside a furnace tube. The automatic wafer boat purging device can specifically comprise a spraying nozzle, a guide rail and a purging control mechanism, wherein the spraying nozzle is used for spraying purging gas to achieve the function that residues in a wafer boat groove are automatically cleared away, in a clearing process, the spraying nozzle can move forwards along the guide rail, and the purging control mechanism is used for controlling the purging states of the spraying nozzle. According to the automatic wafer boat purging device, automatic clearing of the residues is achieved, work of halt, clearing and the like conducted manually in the prior art are avoided, and therefore production cost of products is reduced, and the qualified rate of the products is improved.

Description

Technical field [0001] The invention belongs to the field of semiconductor technology, and specifically relates to an automatic purge device for a wafer boat. Background technique [0002] In the semiconductor manufacturing process, in order to install discrete devices and integrated circuits, different kinds of thin films need to be deposited on the substrate of the wafer. Among various methods for depositing thin films, Low Pressure Chemical Vapor Deposition (LPCVD) is a commonly used method, and has been widely used in various thin film deposition processes. [0003] In the LPCVD process, the mainstream equipment currently used is a vertical furnace tube, and in the furnace tube, a wafer boat is used for wafer transfer, cleaning, and processing. In semiconductor technology, there are generally two materials for wafer boats, one is quartz / silicon carbide, and the other is Teflon. Quartz / silicon carbide wafer boats are used in high temperature (greater than 300℃) occasions, such...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B08B5/02
Inventor 俞玮倪立华裴雷洪
Owner SHANGHAI HUALI MICROELECTRONICS CORP
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