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Preparation method of second harmonic light absorbing material with high damage threshold

A technology with high damage threshold and double frequency light, which is applied in glass manufacturing equipment, manufacturing tools, glass molding, etc., can solve the problems of poor glass formation, difficulty in large-scale production, easy crystallization, etc., and achieve strong absorption and transparency. Good transitivity and the effect of improving load capacity

Active Publication Date: 2015-07-15
XI'AN INST OF OPTICS & FINE MECHANICS - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, fluoride glass also has many disadvantages, such as easy crystallization, poor glass-forming properties, and difficulty in large-scale fabrication.

Method used

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  • Preparation method of second harmonic light absorbing material with high damage threshold
  • Preparation method of second harmonic light absorbing material with high damage threshold
  • Preparation method of second harmonic light absorbing material with high damage threshold

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0023] Embodiment one: according to 1 in table 1 # Calculate the weight percentage of the glass from the molar composition of the sample, take the total amount of raw materials as 10kg, calculate the weight of each component, and mix evenly after weighing. Put the prepared powder into the tongs of the silicon carbon rod electric furnace and melt it one by one. The melting temperature is controlled at about 1050°C, and the melting time is 24 hours. During the melting process, the molten glass is continuously stirred. After the molten glass is clarified, inject the molten glass into the preheated mold to shape, and quickly put the mold filled with the molten glass into the muffle furnace, and anneal at 10°C / hour until the temperature drops to 50°C. Close the muffle furnace, let it cool down to room temperature naturally, and finally take out the finished product.

[0024] The sample is processed into a thin slice with a thickness of 1 cm, and the two large surfaces of the thin ...

Embodiment 2

[0026] Embodiment two: press 2 in table 1 # Calculate the weight percentage of the glass from the molar composition of the sample, take the total amount of raw materials as 10kg, calculate the weight of each component, and mix evenly after weighing. Put the prepared powder into the tongs of the silicon carbon rod electric furnace and melt it one by one. The melting temperature is controlled at about 1080°C, and the melting time is 24 hours. During the melting process, the molten glass is continuously stirred. After the molten glass is clarified, inject the molten glass into the preheated mold to shape, and quickly put the mold filled with the molten glass into the muffle furnace, and anneal at 10°C / hour until the temperature drops to 50°C. Close the muffle furnace, let it cool down to room temperature naturally, and finally take out the finished product.

[0027] The sample is processed into a thin slice with a thickness of 1 cm, and the two large surfaces of the thin slice a...

Embodiment 3

[0029] Embodiment three: press 3 in table 1 # Calculate the weight percentage of the glass from the molar composition of the sample, take the total amount of raw materials as 10kg, calculate the weight of each component, and mix evenly after weighing. Put the prepared powder into the tongs of the silicon carbon rod electric furnace and melt it one by one. The melting temperature is controlled at about 1100°C, and the melting time is 24 hours. During the melting process, the molten glass is continuously stirred. After the molten glass is clarified, inject the molten glass into the preheated mold to shape, and quickly put the mold filled with the molten glass into the muffle furnace, and anneal at 10°C / hour until the temperature drops to 50°C. Close the muffle furnace, let it cool down to room temperature naturally, and finally take out the finished product.

[0030] The sample is processed into a thin slice with a thickness of 1 cm, and the two large surfaces of the thin slice...

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Abstract

The invention provides a preparation method of a second harmonic light absorbing material with high damage threshold. The raw material comprises the following components by molar percent: 25-40% of AlF3, 15-30% of BaF2, 10-25% of MgF2, 14-25.5% of SiO2, 2-4% of Y2O3 and 2-3.5% of CoO. The method comprises the following steps: weighing the raw material and uniformly mixing, adding into a crucible, controlling the melting temperature at about 1050-1150 DEG C, and continuously stirring; after obtaining clean glass molten by melting, cooling to 900-950 DEG C, and injecting high temperature molten glass into a pre-heated mould to form; quickly placing in a muffle furnace and annealing at 10 DEG C / h till the temperature is 50 DEG C; closing the muffle furnace; naturally cooling to room temperature and taking out the final product. The material prepared by the method has high damage threshold, can filter second harmonic light selectively and is highly transparent in ultraviolet band.

Description

technical field [0001] The invention is an oxyfluorine glass, in particular to a preparation method of a high damage threshold double frequency light-absorbing material. Background technique [0002] With the development of laser technology, triple frequency (351nm) laser is widely used. To obtain triple-frequency laser, the usual practice is to double the fundamental frequency light through a double-frequency crystal to double-frequency light, and the double-frequency light and the remaining fundamental-frequency light enter the triple crystal to realize the output of triple-frequency laser. But the triple frequency light from the triple frequency crystal also contains fundamental frequency light and double frequency light. In order to obtain clean triple-frequency light, spectroscopic films, spectroscopic prisms, and spectroscopic gratings are generally used to separate the three wavelengths. High-energy lasers are prone to damage, making it difficult to increase the las...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C03C6/06C03B19/02
CPCY02P40/57
Inventor 彭波侯超奇陆敏王鹏飞高飞李玮楠
Owner XI'AN INST OF OPTICS & FINE MECHANICS - CHINESE ACAD OF SCI