Multi-airbag support device for optical element in lithographic projection lens system

A technology for optical elements and lithography projection, which is applied in the direction of optical elements, microlithography exposure equipment, photolithography exposure devices, etc., and can solve the problems of large influence of optical element surface shape and uneven support force, etc.

Inactive Publication Date: 2013-11-20
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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  • Abstract
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  • Application Information

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Problems solved by technology

[0004] The present invention provides a multi-airbag support device for optical elements in a lithographic projection objective lens system to solve the problems of

Method used

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  • Multi-airbag support device for optical element in lithographic projection lens system
  • Multi-airbag support device for optical element in lithographic projection lens system
  • Multi-airbag support device for optical element in lithographic projection lens system

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Embodiment Construction

[0018] The present invention will be described in further detail below in conjunction with the accompanying drawings.

[0019] Such as Figure 1-3 As shown, the optical element multi-airbag support device in the lithography projection objective lens system includes an optical element 1, a plurality of airbags 2, a base 3, an inflatable tube 4 and an adapter 5; the optical element 1 is placed on a plurality of airbags 2; The airbags 2 are evenly distributed along the circumference on the base 3; the airbags 2 are connected with the inflation tube 4 through the adapter 5. The airbag 2 is made of organic rubber material.

[0020] Such as Figure 4 As shown, the airbag 2 includes an airbag 2-1, and threaded clearance holes 2-2 are provided on both sides of the bottom for fixing. Air intake holes 2-3 are arranged at the bottom for inflation, and each air bag 2 is equipped with an inflation tube 4, and the inflation tube 4 is connected with a valve and an air source. The upper e...

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Abstract

The invention relates to a multi-airbag support device for an optical element in a lithographic projection lens system, belonging to the technical field of deep ultraviolet projection lithography lens. In order to solve the problems of the existing optical element detection device such as significant effects on lens surface types and non-uniform support force, the device comprises an optical element, a plurality of airbags, a base, an air-filled tube and a plurality of adapters; the optical element is arranged on the airbags; the airbags are uniformly arranged on the base and along the periphery, are connected with the air-filled tube through the adapters and comprise air pockets; the two sides o the bottoms of the airbags are provided with two rows of threaded holes; the bottoms of the airbags are provided with an inlets; the base comprises long holes, threaded holes, weight-reducing holes and grooves; the air inlets of the airbags are arranged in a manner of extending into the long holes in the base; the threaded holes in the bottoms of the airbags is connected with the threaded holes in the base through screws; the weight-reducing holes are arranged in the central circular area of the base; the grooves are fitted with the air-filled tube. Effects of regulating forces on the surface type of the optical element can be reduced effectively, and trefoil aberration and astigmatism caused during mechanical clamping can be avoided.

Description

technical field [0001] The invention relates to the technical field of deep ultraviolet projection lithography objective lens assembly and adjustment, in particular to a support device that can be used for optical elements in a lithography projection objective lens system. Background technique [0002] Projection lithography equipment is one of the core equipment in the large-scale integrated circuit manufacturing production line. Molecular laser projection lithography equipment has become the mainstream equipment for integrated circuit manufacturing at 90nm, 65nm and 45nm nodes. [0003] The structural design of the projection lithography objective lens and before and during the assembly process have high requirements for the repeatability of the optical element inspection, and the optical element needs to be as uniform as possible in the process of being supported by the inspected tooling, so as to be less affected by the supporting force, and at the same time Minor adjus...

Claims

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Application Information

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IPC IPC(8): G02B7/00G03F7/20
Inventor 彭海峰巩岩何欣陈华男李显凌倪明阳
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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