Holding clamp for etching

A fixture and etching technology, which is applied in the field of holding fixtures, can solve the problem of unsmooth flow field of etching liquid, etc., and achieve the effect of reducing etching time and making it easier to go up and down

Active Publication Date: 2013-12-04
GRAND PLASTIC TECH
View PDF3 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although it can prevent the glass bottom plate from breaking, the edge of the glass bottom plate is still in contact with the fixture, and the lower frame makes the flow field of the etching solution not smooth, which is its disadvantage

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Holding clamp for etching
  • Holding clamp for etching
  • Holding clamp for etching

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0044] see Figure 2 to Figure 7 , the present invention provides an etching holding fixture 200 for a glass sheet or a wafer, which includes two side plates 202, 204, four support rods 206, a plurality of splints 208, two splint slide bars 216 and two A splint bar 214.

[0045] The side plates 202, 204 are preferably but not limited to square plate bodies. The two side plates 202, 204 are separated from the left and right sides, and the four support rods 206 are connected to the left and right side plates 202, 204. A support rod 206 is connected to the four corners of the two side plates 202,204. Two ends of the supporting rod 206 are connected to the left and right side plates 202 , 204 to form an open body of the etching holding fixture 200 . The two ends of the support rod 206 can be connected to the two side plates 202, 204 by means of welding, screwing or embedding, and the two ends of the support rod 206 can also be connected to the two side plates 202, 204 by integra...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

A holding clamp for etching comprises two side plates, a plurality of support rods, a plurality of clamp plates, at least two clamp plate sliding rods and at least one clamp plate press rod, wherein the two side plates are disposed at a left side and a right side respectively; the plurality of support rods are connected to the two side plates; the plurality of clamp plates are disposed between the two side plates; the at least two clamp plates are disposed between the two side plates and pass through the plurality of clamp plates; and the at least one clamp plate press rod is disposed on one side plate. With the above structure, the holding clamp can hold workpieces such as glass sheets or wafers etching and make etching liquid flow smoothly. Edges of the workpieces such as the glass sheets or the wafers are not contacted with the clamp, so that the edges can be etched clean.

Description

technical field [0001] The present invention relates to a holding fixture used in glass edge strengthening wet etching process, but is not limited to this application. This kind of holding fixture can improve the uniformity and efficiency of the liquid flow field without touching the edge of the object to be etched, so that the uniformity and yield of the edge etching are greatly improved, and it can also reduce the soaking and cleaning time after etching, and improve the cleaning efficiency. Can avoid acid residue. Background technique [0002] In the integrated circuit or panel manufacturing process, the traditional fixture for removing the remaining photoresist by wet etching such as figure 1 As shown, when a workpiece 104 such as a glass sheet or a wafer is clamped by the fixture 102, there are at least four contact points, so that the etching is incomplete and residues remain on the edge, which is the most disadvantageous for the panel. In addition, because the bottom...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C03C15/00
Inventor 陈毓正吴宗恩余智林
Owner GRAND PLASTIC TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products