Recovery circuit and recovery method for positive bias temperature instability
A technology of positive bias temperature and instability, applied in logic circuits, electrical components, pulse technology, etc., can solve the problems of NMOS transistors, such as the influence of positive bias temperature instability, threshold voltage shift, etc., and achieve good PBTI characteristics The effect of recovery effect
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[0035]The inventors have found through research that the temperature instability of the positive bias voltage has an obvious recovery effect. Since the channel region of the NMOS transistor needs to be applied with a positive bias gate voltage, and the high-K / metal gate stack structure is easy to capture electrons in the high-K gate dielectric layer and Si, it is easy to make the high-K metal gate stack structure The threshold voltage of the NMOS transistor is shifted, so that the NMOS transistor has a PBTI characteristic. When the gate voltage becomes smaller, that is, when the absolute value of the gate voltage becomes smaller or becomes a negatively biased gate voltage, the NMOS transistor can return to a more normal state, and when the absolute value of the gate voltage The NMOS transistor recovers to a more normal state faster and better when the value is changed to a negatively biased gate voltage. However, since the operating voltage value applied to the gate in existi...
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