Display substrate and manufacturing method and display device of display substrate
A technology for display substrates and manufacturing methods, applied in semiconductor/solid-state device manufacturing, instruments, semiconductor devices, etc., can solve problems such as rising cost of display device products, and achieve the effect of reducing production costs and simplifying production steps
Active Publication Date: 2015-05-20
HEFEI BOE OPTOELECTRONICS TECH +1
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Problems solved by technology
Excessive number of patterning processes will directly lead to an increase in the cost of display device products, so how to further reduce the number of patterning processes has become an issue of increasing concern
Method used
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Embodiment Construction
[0044] It should be noted:
[0045] 1. The "upper" in "X is arranged on Y" or "X is arranged on Y" in the present invention includes the meaning that X is in contact with Y and that X is located above Y. In the present invention, as attached As shown in the figure, the substrate is defined as being set at the bottom;
[0046] 2. The patterning process referred to in the present invention includes processes such as photoresist coating, masking, exposure, development, etching, photoresist stripping, and the photoresist is an example of a positive photoresist;
[0047] 3. The "so-and-so region" mentioned in the present invention is the region where a certain pattern is mapped on the substrate, that is, the region has the same shape as the certain pattern, such as the grid line area, which is the pattern of the grid line on the substrate The mapped area can also be understood as the area on the substrate where the grid pattern will be set.
[0048] The following will clearly and...
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Embodiments of the present invention provide a display substrate, a manufacturing method thereof, and a display device, and relate to the field of display technologies. The method includes the step of forming an etching barrier pattern and a first electrode pattern on the substrate, and the step of forming the etching barrier pattern and the first electrode pattern includes: sequentially forming an etching barrier film and a first electrode film, by One patterning process forms the pattern of the etching barrier layer and the pattern of the first electrode. The invention omits the patterning process of separately forming the pattern of the etching barrier layer, simplifies the process flow and saves the production cost. The embodiment of the present invention is used to manufacture a display device.
Description
technical field [0001] The present invention relates to the field of display technology, in particular to a display substrate, a manufacturing method thereof, and a display device. Background technique [0002] With the continuous development of TFT-LCD (Thin Film Transistor Liquid Crystal Display, Thin Film Transistor Liquid Crystal Display) display technology, more and more new technologies are constantly being proposed and applied. TFT-LCD based on ADS (Advanced Super Dimension Switch, AD-SDS, referred to as ADS, Advanced Super Dimension Field Switching Technology) mode has attracted more and more people's attention due to its low power consumption, wide viewing angle and other characteristics. [0003] ADS technology mainly forms a multi-dimensional electric field through the electric field generated by the edge of the slit electrode in the same plane and the electric field generated between the slit electrode layer and the plate electrode layer, so that all aligned liqu...
Claims
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IPC IPC(8): H01L21/77H01L27/12G02F1/1362G02F1/1368
CPCH01L27/1288H01L27/1225G02F1/136227G02F1/1368H01L27/124H01L27/1248G02F1/134318G02F1/136236G02F1/134372G02F1/136295G02F1/134309G02F1/136286G02F2201/121G02F2201/123H01L29/7869
Inventor 段献学白明基徐德智邹志翔
Owner HEFEI BOE OPTOELECTRONICS TECH