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A kind of array substrate and its preparation method and display device

An array substrate and substrate substrate technology, which is applied in semiconductor/solid-state device manufacturing, semiconductor devices, electrical components, etc., can solve problems such as restricting the production efficiency of liquid crystal display products and complex preparation processes, and achieves simplified and reduced preparation processes. , the effect of improving the preparation efficiency

Active Publication Date: 2020-03-13
BOE TECH GRP CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The above preparation process is still relatively complicated, which restricts the production efficiency of liquid crystal display products to a certain extent

Method used

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  • A kind of array substrate and its preparation method and display device
  • A kind of array substrate and its preparation method and display device
  • A kind of array substrate and its preparation method and display device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0052] This embodiment provides a method for preparing an array substrate, such as Figures 2A-2H As shown, it includes: forming a switch tube 2 and a first electrode 3 on a base substrate 1, and simultaneously forming a source 21 and a drain 22 of the switch tube 2 and a first electrode 3 (such as Figure 2G-2H shown).

[0053]In this embodiment, the first electrode 3 is a pixel electrode. The source 21 and drain 22 of the switch tube 2 and the first electrode 3 are simultaneously formed by chemical mechanical polishing, which can reduce the patterning process of the source 21 and the drain 22 and the patterning process of the first electrode 3 in the array substrate preparation process , so that the preparation process of the array substrate is greatly simplified. The patterning process refers to the step of coating photoresist, exposing, developing, etching to form the pattern including the source electrode 21 and the drain electrode 22 and the step of etching to form the...

Embodiment 2

[0064] This embodiment provides a method for preparing an array substrate. The difference from Embodiment 1 is that, as Figures 4A-4H As shown, on the basis of the preparation method of the array substrate in Embodiment 1, before forming the passivation layer 4, it also includes: forming an organic insulating layer 5 and a second electrode 6 on the base substrate 1, the second electrode 6 and the gate 24 are simultaneously formed through a patterning process, and the organic insulating layer 5 is formed on the side of the active layer 23 facing away from the base substrate 1 . Wherein, the first electrode 3 is a pixel electrode, and the second electrode 6 is a common electrode, that is, the array substrate in this embodiment is in an ADS (ADvanced Super Dimension Switch, Advanced Super Dimension Switching Technology) display mode.

[0065] Wherein, the second electrode 6 and the grid 24 are formed simultaneously through a patterning process, such as the second electrode 6 and...

Embodiment 3

[0072] This embodiment provides a display device, including the array substrate in Embodiment 1 or 2.

[0073] By using the array substrate in Embodiment 1 or 2, the manufacturing process of the display device is reduced, and the manufacturing efficiency of the display device is improved.

[0074] The display device provided by the present invention can be any product or component with a display function, such as a liquid crystal panel, a liquid crystal TV, a monitor, a mobile phone, or a navigator.

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Abstract

The invention provides an array substrate, a preparation method thereof and a display device. The preparation method comprises that a switch tube and a first electrode are formed on a substrate, and source and drain electrodes of the switch tube and the first electrode are formed simultaneously by using a chemical-mechanical grinding method. Thus, composition technology of source and drain electrodes and composition technology of the first electrode in the preparation technology of the array substrate can be reduced, the preparation technology of the array substrate is simplified greatly, and the preparation efficiency of the array substrate is further improved.

Description

technical field [0001] The present invention relates to the field of display technology, in particular, to an array substrate, a manufacturing method thereof, and a display device. Background technique [0002] Metal oxide switching tube liquid crystal display products (Oxide-TFT LCD) currently mainly have two types of preparation processes, one is back channel etching BCE (Back Channel Etch) process, the other is etching stop ESL (Eetch StopLayer ) process. Since the BCE process has one less patterning process step, it can save manufacturing costs and improve product competitiveness compared with the ESL process. [0003] At present, in the manufacture of array substrates of medium and large-sized ADS (ADvanced Super Dimension Switch, advanced ultra-dimensional field switching technology) liquid crystal display products, the BCE 5mask (ie, 5 mask exposure) process is generally used; Figures 1A-1E As shown, the basic preparation process is 1ITO->Gate->SDT->PVX->2I...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L27/12H01L21/77
CPCH01L27/1248H01L27/1259H01L27/127
Inventor 张小祥刘明悬张治超刘正刘帅郭会斌
Owner BOE TECH GRP CO LTD