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semiconductor structure

A semiconductor and compound semiconductor technology, applied in semiconductor devices, electrical components, circuits, etc., can solve problems affecting the light output rate of semiconductor structures

Active Publication Date: 2016-12-07
TSINGHUA UNIV +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] However, since the refractive index of the semiconductor is greater than that of air, the near-field evanescent light waves (waves with an attenuation distance less than 20 nanometers) from the active layer cannot exit due to rapid attenuation during the outward radiation process, so they are limited to The interior of the semiconductor structure, until it is completely absorbed by the material in the semiconductor structure, affects the light extraction rate of the semiconductor structure

Method used

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Embodiment Construction

[0024] Embodiments and specific embodiments of the semiconductor structure, the light emitting diode and the manufacturing method thereof provided by the present invention will be described in detail below with reference to the accompanying drawings.

[0025] see figure 1 , the first embodiment of the present invention provides a semiconductor structure 10, which includes a substrate 100, a first semiconductor layer 110, an active layer 120, a second semiconductor layer 130, a first optically symmetrical layer 140, a metal plasma Volume generating layer 150 and a second optically symmetrical layer 160 . The first semiconductor layer 110, the active layer 120, the second semiconductor layer 130, the first optically symmetrical layer 140, the metal plasma generation layer 150, and the second optically symmetrical layer 160 are sequentially stacked on the surface of the substrate 100, And the first semiconductor layer 110 is disposed close to the substrate 100 . The first semic...

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Abstract

The present invention relates to a semiconductor structure, which comprises: a first semiconductor layer, an active layer and a second semiconductor layer stacked in sequence; a first optically symmetrical layer arranged on the second semiconductor layer away from the first semiconductor layer A metal plasma generation layer is disposed on the surface of the first optically symmetrical layer away from the first semiconductor layer; a second optically symmetrical layer is disposed on the surface of the metal plasma generation layer away from the first semiconductor layer.

Description

technical field [0001] The present invention relates to a semiconductor structure. Background technique [0002] High-efficiency blue, green, and white light-emitting diodes made of gallium nitride semiconductor materials have remarkable features such as long life, energy saving, and environmental protection. They have been widely used in large-screen color displays, automotive lighting, traffic signals, multimedia displays, and optical communications. And other fields, especially in the field of lighting has broad development potential. [0003] A traditional semiconductor structure usually includes a substrate, an N-type semiconductor layer, a P-type semiconductor layer, an active layer arranged between the N-type semiconductor layer and the P-type semiconductor layer, and a P-type electrode (usually transparent electrode) and the N-type electrode disposed on the N-type semiconductor layer. The N-type semiconductor layer, the active layer and the P-type semiconductor lay...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L33/44
CPCH01L33/04H01L33/22H01L33/44H01L2933/0091H01L33/58
Inventor 朱钧张淏酥朱振东李群庆金国藩范守善
Owner TSINGHUA UNIV
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