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Polyimide resin, resin composition and laminated film using same

A technology of polyimide resin and resin composition, applied in the direction of synthetic resin layered products, film/sheet adhesive, application, etc., can solve problems such as insufficient heat resistance and adverse effects of electronic components, achieve good adhesion

Active Publication Date: 2014-04-23
TORAY IND INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] Since acrylic resins also have high transparency, they are widely used as optical materials for flat panel displays such as liquid crystal displays (for example, see Patent Document 1). , the acrylic resin itself decomposes to produce volatile components, so the heat resistance is not sufficient
Silicone-based resins have a wide operating temperature range from low temperature to high temperature, and exhibit higher heat resistance than acrylic resins (for example, see Patent Document 2), but they are longer at temperatures above 250°C, and furthermore, at temperatures above 300°C. When left for a long time, volatile components are generated due to decomposition, etc.
In addition, since silicone-based adhesives contain low-molecular-weight silicone components, they also have the problem of adversely affecting electronic components.

Method used

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  • Polyimide resin, resin composition and laminated film using same
  • Polyimide resin, resin composition and laminated film using same
  • Polyimide resin, resin composition and laminated film using same

Examples

Experimental program
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Effect test

Embodiment

[0060] The following examples are given to illustrate the present invention, but the present invention is not limited to these examples. Evaluation methods for glass transition temperature, weight loss rate, and adhesive force will be described.

[0061] (1) Determination of glass transition temperature

[0062] After applying the polyamic acid resin solutions (PA1 to PA18) described in the following Preparation Examples 1 to 18 on the glossy surface of an electrolytic copper foil with a thickness of 18 μm to a thickness of 20 μm, the Dry at 150° C. for 10 minutes, and then at 150° C. for 10 minutes, and then heat-process at 250° C. for 10 minutes in a nitrogen atmosphere to convert to polyimide and obtain a polyimide laminated copper foil. Then, the entire surface of the copper foil of the obtained polyimide laminated copper foil was etched with a ferric chloride solution, and the single film of polyimide was obtained.

[0063] About 10 mg of the obtained single film of pol...

preparation example 1

[0090] Preparation Example 1 (Polymerization of Polyamic Acid Resin Solution)

[0091] Add APPS286g (0.1mol), 44DAE80.1g (0.4mol), DMAc1285g to a reaction kettle equipped with a thermometer, a dry nitrogen inlet, a heating and cooling device using warm water? ODPA155.1g (0.5mol) was made to react at room temperature for 1 hour, and then it was made to react at 60 degreeC for 5 hours, and the polyamic-acid resin solution (PA1) of 20 weight% was obtained.

preparation example 2~11

[0092] Preparation examples 2-11 (polymerization of polyamic acid resin solution)

[0093] Except changing the kind and input amount of acid dianhydride and diamine according to Table 1, the same operation as Preparation Example 1 was performed to obtain a 30% by weight polyamic acid resin solution (PA2-PA11).

[0094] [Table 1] Upper layer: composition ratio (mol%) / lower layer: input amount (g)

[0095]

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Abstract

Provided are: a polyimide film in which volatile matter is not generated due to decomposition etc., and which has good adhesiveness, even at high temperatures of 250 DEG C and above; and a resin composition and a laminated film that use the polyimide film. The polyimide resin is characterized by having at least an acid dianhydride residue and a diamine residue, and a glass transition temperature of not more than 30 DEG C, and is further characterized in that the diamine residue contains a polysiloxane diamine residue represented by general formula (1). (n is a natural number, and has an average value, which is calculated from the average molecular weight of the polysiloxane diamine, of five to thirty. R1 and R2 may be the same or different, and each represents an alkylene group or a phenylene group with one to thirty carbons. R3 to R6 may be the same or different, and each represents an alkyl group, a phenyl group or a phenoxy group with one to thirty carbons.)(The formula is shown in the specification.)

Description

technical field [0001] This invention relates to heat resistant adhesives. More specifically, it relates to heat-resistant bonding of engineering materials, etc., which can be used in the manufacture of electronic devices without generating volatile components due to decomposition of the adhesive even in a high-temperature environment. agent. Background technique [0002] In the past, rubber-based adhesives such as natural rubber and styrene-butadiene rubber were often used as adhesives. However, since high heat resistance is required for engineering materials used in the manufacture of electronic equipment, acrylic resins are increasingly used. , Silicone resin. [0003] Since acrylic resins also have high transparency, they are widely used as optical materials for flat panel displays such as liquid crystal displays (for example, see Patent Document 1). , The acrylic resin itself decomposes to generate volatile components, so the heat resistance is not sufficient. Silic...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08G73/10C09J7/00C09J179/08C09J183/08C09J183/10B32B27/34
CPCC08G73/106C08G77/455C08G73/1042C08G77/26C09J179/08B32B27/281B32B2379/08B32B2307/306B32B2457/202Y10T428/1476Y10T428/2839Y10T428/2896B32B17/10B32B27/34C09J2479/08C09J2301/122C09J2301/302
Inventor 渡边拓生李忠善
Owner TORAY IND INC
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