Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Magnetron sputtering coating system

A technology of magnetron sputtering coating and sputtering cavity, which is applied in the field of magnetron sputtering coating system and can solve the problems of uneven temperature distribution and instability, etc.

Active Publication Date: 2016-01-13
WGTECH JIANGXI
View PDF7 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] Based on this, it is necessary to provide a magnetron sputtering coating system with a relatively uniform and stable temperature distribution in the chamber for the problem of uneven and unstable temperature distribution in the chamber of the current magnetron sputtering coating system.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Magnetron sputtering coating system
  • Magnetron sputtering coating system
  • Magnetron sputtering coating system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0025] In order to make the above objects, features and advantages of the present invention more comprehensible, specific implementations of the present invention will be described in detail below in conjunction with the accompanying drawings. In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present invention. However, the present invention can be implemented in many other ways different from those described here, and those skilled in the art can make similar improvements without departing from the connotation of the present invention, so the present invention is not limited by the specific implementations disclosed below.

[0026] Please also refer to figure 1 with figure 2 , a magnetron sputtering coating system 100 according to an embodiment includes a magnetron sputtering coating chamber 10 and a three-stage heating device 20 . The three-stage heating device 20 is disposed in the magnetron sputteri...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a magneto-controlled sputter coating system which comprises a magneto-controlled sputter coating chamber. The magneto-controlled sputter coating system is characterized by also comprising a three-section heating device which is arranged in the magneto-controlled sputter coating chamber; the three-section heating device comprises a three-section heater and a heat reflection plate; the three-section heater comprises a first heating section, a second heating section and a third heating section; the first, second and third heating sections are arranged on the heat reflection plate; the first heating section comprises a plurality of parallel first heating tubes; the second heating section comprises a plurality of parallel second heating tubes; and the third heating section comprises a plurality of parallel third heating tubes. The heat generated by the three-section heater which comprises the first, second and third heating sections are reflected through the heat reflection plate for insulation, so that the heating of the cavity is relatively uniform and the temperature distribution in the cavity is relatively uniform and stable.

Description

technical field [0001] The invention relates to the technical field of magnetron sputtering coating, in particular to a magnetron sputtering coating system. Background technique [0002] Magnetron sputtering coating is a coating method commonly used at present. In the current magnetron sputtering coating system, the temperature distribution inside the chamber is uneven and unstable, which will not only affect the characteristics of the film layer, but also increase the fragmentation rate of the product, resulting in a low production yield. Contents of the invention [0003] Based on this, it is necessary to provide a magnetron sputtering coating system with a relatively uniform and stable temperature distribution in the chamber to solve the problem of uneven and unstable temperature distribution in the chamber of the current magnetron sputtering coating system. [0004] A magnetron sputtering coating system, including a magnetron sputtering coating chamber, also includes ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/35
Inventor 张迅阳威欧阳小园易伟华
Owner WGTECH JIANGXI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products