Substrate processing apparatus, substrate processing method, substrate holding mechanism, and substrate holding method
A substrate processing device and substrate technology, applied to each unit, substrate holding mechanism, substrate processing device, and substrate processing, various components or devices, can solve problems such as unstable pure water flow, and achieve improved response delay, Appropriate and reliable control, the effect of improving responsiveness
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[0122] Hereinafter, embodiments of the substrate processing apparatus of the present invention will be described in detail with reference to the accompanying drawings. The same reference numerals are attached to the same or equivalent components, and overlapping descriptions thereof are omitted.
[0123] figure 1 It is a top view which shows the whole structure of the substrate processing apparatus which concerns on one Embodiment of this invention. like figure 1 As shown, this substrate processing apparatus has a substantially rectangular casing 1, and the interior of the casing 1 is partitioned into a load / unload unit 2, a polishing unit 3, and a cleaning unit 4 by partition walls 1a and 1b. The above-mentioned loading / unloading unit 2, grinding unit 3, and cleaning unit 4 are independently combined and exhausted independently. Further, the substrate processing apparatus includes a control unit 5 that controls the substrate processing operation.
[0124] The loading / unlo...
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