Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A kind of nano silicon dioxide with controllable particle size and preparation method thereof

A technology of nano-silica and particle size, which is applied in dyeing organosilicon compound treatment, dyeing physical treatment, fibrous filler, etc., can solve the problem of uneven surface roughness of paint, uneven reflectiveness of painted surface, difficulty in particle size, etc. Control and other problems, to achieve the effect of uniform matting effect, consistent hand feeling, and concentrated particle size distribution

Active Publication Date: 2016-01-20
FUJIAN SHUNCHANG XINHE NANO SILICON IND
View PDF7 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The nano-silica prepared by the currently known preparation technology is difficult to control the particle size, and it is distributed in a relatively large range of 1-30um.
Due to the large particle size distribution range, the surface roughness of the paint is not uniform enough, the reflectivity of different parts of the painted surface is not uniform, and the touch feeling is not uniform

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A kind of nano silicon dioxide with controllable particle size and preparation method thereof
  • A kind of nano silicon dioxide with controllable particle size and preparation method thereof
  • A kind of nano silicon dioxide with controllable particle size and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0035] Prepare nano silicon dioxide, complete by the following steps:

[0036] Step (1): Add 10Be (Baumé) natron to the synthesis kettle, start stirring at room temperature, add sulfuric acid with a concentration of 10%, and control the acid flow rate to 0.5m 3 / h, adjust the pH to be 4, react slowly, and wait for the granulation to be uniform to prepare the slurry;

[0037] Step (2): Add a silane coupling agent to the slurry in step (1), stir evenly, raise the temperature to 60°C, and age at a constant temperature for 1 hour, then transfer to the plate frame for washing.

[0038] Step (3): Break up the washed materials in step (2) to make slurry, send the slurry to the drying system for drying, the inlet temperature of the drying system is 400°C, and transfer the slurry to the atomizer after drying. Masterbatch.

[0039] The particle size of the masterbatch is detected with a laser particle size analyzer, and the results are found in figure 1 .

[0040] Step (4): Put the ...

Embodiment 2

[0043] The preparation of nano silicon dioxide with controllable particle size is completed by the following steps:

[0044] Step (1): Add 30 Be (Baumé) natron to the synthesis kettle, start stirring at room temperature, add sulfuric acid with a concentration of 30%, and control the acid flow rate to 1.75m 3 / h, adjust the pH to 2.5, react slowly, and wait for the granulation to be uniform to prepare the slurry;

[0045] Step (2): Add a surface modifier to the slurry in step (1), stir evenly, raise the temperature to 80°C, and age at a constant temperature for 1 hour, then transfer to the plate frame for washing.

[0046] Step (3): Break up the washed materials in step (2) to make slurry, send the slurry to the drying system for drying, the inlet temperature of the drying system is 450°C, and transfer the slurry to the atomizer after drying. Masterbatch.

[0047] The particle size of the masterbatch is detected with a laser particle size analyzer, and the results are found i...

Embodiment 3

[0051] The preparation of nano silicon dioxide with controllable particle size is completed by the following steps:

[0052] Step (1): Add 50 Be (Baumé) natron to the synthesis kettle, start stirring at room temperature, add sulfuric acid with a concentration of 50%, and control the acid flow rate to 3.0m 3 / h, adjust the pH to 1, react slowly, wait until the granulation is uniform, and prepare the slurry;

[0053] Step (2): Add a silane coupling agent to the slurry in step (1), stir evenly, raise the temperature to 100°C, and age at a constant temperature for 1 hour, then transfer to the plate frame for washing.

[0054]Step (3): Disperse the washed material in step (2) to make slurry, send the slurry to the drying system for drying, the inlet temperature of the drying system is 500°C, and transfer the slurry to the atomizer after drying. Masterbatch.

[0055] The particle size of the masterbatch is detected with a laser particle size analyzer, and the results are found in ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses particle size controllable nano silica and a preparation method thereof, relating to a granulating technology for silica. The particle size of nano silica prepared according to currently known preparation technologies is difficult to control, and distributed within a relatively large range of 1-30mu m. The invention discloses particle size controllable nano silica and a preparation method thereof which are used for solving the defects. According to the invention, slurry is prepared by using sodium metasilicate and sulfuric acid, a master batch is prepared by using an atomizer, and the master batch is crushed by using a fluidization crusher so as to obtain a finished product. The granularity of the finished product is 4-6mu m, the granularity is distributed in a concentrated mode, and large particles are significantly decreased.

Description

technical field [0001] The invention relates to silicon dioxide granulation technology, in particular to a nanometer silicon dioxide with controllable particle size and a preparation method thereof. Background technique [0002] In recent years, my country's coatings industry is in the ascendant, and the total output of coatings has leapt to the forefront of the world, forming an industrial group centered on coatings, and actively promoting technological innovation and development in the coatings field. According to the intensity of the paint reflection, the paint can be roughly classified into three categories: glossy, matte, and dull. Due to the high reflection of glossy paint, bright and dazzling, it does not meet the mainstream of people's pursuit of leisure and fashion today, and its market share is declining year by year. In contrast, the demand for matt or matt paints with soft light is increasing dramatically. This creates a favorable market environment for researc...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C09C1/28C09C3/12C09C3/04
Inventor 武晓旭杨子敏
Owner FUJIAN SHUNCHANG XINHE NANO SILICON IND
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com