Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

An in-situ measurement method for large-scale flatness

A measurement method and flatness technology, which are applied in the field of high-precision measurement of large-scale flatness and high-precision in-situ detection of large-scale flatness during processing, which can solve problems such as low measurement efficiency, inability to meet detection tasks and measurement problems. , to achieve the effect of high measurement accuracy, saving detection cost and fast sampling time

Active Publication Date: 2017-01-25
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
View PDF3 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This method is suitable for flatness error measurement of large and medium-sized planes, and has high precision; the disadvantage is that the measurement efficiency is low, and only continuous planes can be measured
[0010] In summary, the existing large-scale flatness detection methods cannot meet the urgent detection tasks and measurement problems due to the applicable size, efficiency, precision, cost, technology and other reasons.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • An in-situ measurement method for large-scale flatness
  • An in-situ measurement method for large-scale flatness
  • An in-situ measurement method for large-scale flatness

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0025] Various details involved in the technical solution of the present invention will be described in detail below in conjunction with the accompanying drawings. It should be noted that the described embodiments are only intended to facilitate the understanding of the present invention, and do not serve as any limitation.

[0026] Such as figure 1 It shows the large-scale flatness high-precision in-situ measurement method based on the dual-station laser tracker of the present invention. This method is based on the spherical coordinate principle of the laser tracker and the high-precision distance measurement characteristics. Using the measurement data of one station to perform error compensation on the measurement data of the other station, so as to improve the flatness measurement accuracy. The embodiment of the inventive method is as follows: the method is completed through the following steps:

[0027] Step S2: Arrange two laser trackers near the measured plane 3, and t...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides an in-suit measuring method of large size planeness. The method comprises the steps as follows: two station laser trackers are arranged near the tested plane; a height difference is formed between the two station laser trackers relative to the tested plane; system errors of the two station laser trackers are automatically calibrated; the two station laser trackers are arranged at two different positions near the tested plane, and respectively measure coordinates of the same tested points on the tested plane, so as to respectively obtain first position coordinate data and second position coordinate data of the two station laser trackers; error compensation is carried out on the second position coordinate data by using the first position coordinate data, so as to obtain compensated coordinate data; and the compensated coordinate data are calculated, so as to obtain the planeness of the tested plane. The measurement data error of the other station is compensated by one station, so that the planeness measurement accuracy is improved. The in-suit measuring method is simple and efficient to measure, and easy to achieve, and especially has important application value in in-suit detection of the large size planeness in the machining process.

Description

technical field [0001] The invention belongs to the field of precision measurement and relates to a high-precision measurement method for large-size flatness, and is especially suitable for high-precision on-site detection of large-size flatness during processing. Background technique [0002] A large-sized plane refers to a plane of several meters or even tens of meters. Compared with the conventional size, large workpieces are difficult to move. Therefore, the testing occasion has shifted from the metrology laboratory to the large-scale industrial manufacturing site with many interference factors. The measuring equipment and system must be carried out on site. Formation, calibration and value transfer. At the same time, extremely high measurement accuracy requirements (micron level), diversity of measured objects, and measurement efficiency are also important challenges in large-scale flatness measurement. Therefore, large-scale flatness precision measurement technology ha...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G01B11/30
Inventor 李杰吴时彬曹学东朱文杨杰
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products