A Novel High Speed ​​Digital Scanning Direct Write Lithography Device

Abstract

The invention discloses a novel high-speed digital-scanning direct-writing photoetching device. The novel high-speed digital-scanning direct-writing photoetching device comprises a light source, an optical illumination system, a programmable pattern generator, a projection optical system and a high-speed precision moving platform. An exposure light beam is emitted by the light source, goes into the optical illumination system and is aligned to form a parallel uniform area light source, the area light source is projected on the programmable pattern generator, simultaneously, graphic information of the programmable pattern generator is transmitted into the projection optical system with the light, the exposed light goes through the projection optical system and then projection imaging is realized on a base of the high-speed precision moving platform. The novel high-speed digital-scanning direct-writing photoetching device avoids a mask plate or film plate processing process, can improve refreshing frequency of the programmable pattern generator by dozens of times, can improve a product processing rate and can improve a product processing yield. The novel high-speed digital-scanning direct-writing photoetching device realizes simple manufacture and reduces a product production cost.

Description

technical field [0001] The present invention relates to the field of lithography technology applied in semiconductor processing (including circuit board manufacturing PCB, flat panel display FPD, light-emitting diode LED, printing CTS and CTcP (CTP), photomask and other processing fields using semiconductor processing technology), specifically relates to A high-speed digital scanning direct writing lithography device. Background technique [0002] A photolithography device is a device that "engraves" a specially defined structural pattern on a substrate (also called a substrate) coated with a photosensitive substance through an optical system, and is used to generate circuit patterns. It is an equipment used in the processing of semiconductors and PCBs. most critical equipment. Substrates can include silicon wafers or reticles used in the manufacture of semiconductor devices, reticles for flat panel displays (such as liquid crystal displays), printed circuit boards (PCBs), ...

AI Technical Summary

Problems solved by technology

[0007] The present invention is different from the image generators used in other SLM technologies. The image generators used in the current SLM technology mostly use M*N pixel structures (M>1, N>1). Since two or more image units are driven at the same time, Greatly limit the refresh rate of the image generator, causing a bottleneck in the production capacity

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