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In-line type heat treatment apparatus

A heat treatment device, in-line technology, applied in the direction of electrical components, semiconductor/solid-state device manufacturing, circuits, etc., can solve the problems of substrate pollution, reduce the reliability of finished products, etc., and achieve the effect of reducing damage and improving reliability.

Inactive Publication Date: 2014-10-01
TERASEMICON CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] In addition, since the existing heat treatment equipment directly mounts and transports the substrate on multiple rotatable rollers, particles (Particles) generated by the friction between the rollers and the substrate that are in contact with each other may cause contamination of the substrate. thereby reducing the reliability of the finished product

Method used

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  • In-line type heat treatment apparatus
  • In-line type heat treatment apparatus
  • In-line type heat treatment apparatus

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Embodiment Construction

[0040] The present invention will be described in detail with reference to the drawings shown in the drawings, which can implement specific embodiments of the present invention. Through these embodiments, those skilled in the art can fully implement the present invention. While the various embodiments of the invention differ from each other, these should not be construed as mutually exclusive. For example, the described specific shapes, structures, and characteristics can be embodied in other embodiments without departing from the spirit and scope of the present invention. In addition, the positions and arrangements of individual components in each of the disclosed embodiments can be changed without departing from the spirit and scope of the present invention. Therefore, the following detailed description is not intended to be limiting, and the scope of the present invention is limited only by the scope of equivalents claimed by the claims and the appended claims. Similar re...

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Abstract

An in-line heat treatment apparatus is disclosed. The in-line heat treatment apparatus, according to the present invention, comprises: a plurality of furnaces (110a, 120a, 130a, 140a, 150a) arranged sequentially and individually providing a space for heat treatment; a substrate transfer unit (370) for transferring a substrate (50) by being installed in the furnaces (110a, 120a, 130a, 140a, 150a), respectively; and a plurality of heaters (200) which is installed at predetermined intervals in a direction perpendicular to the transport direction of the substrate (50) by passing through each of the furnaces (110a, 120a, 130a, 140a, 150a) to heat the substrate (50).

Description

technical field [0001] The present invention relates to an in-line heat treatment device. More specifically, by providing a plurality of heaters penetrating through a plurality of furnaces, it is possible to uniformly maintain the temperature of the entire area of ​​the furnace and perform uniform heat treatment on the entire substrate. Background technique [0002] An annealing device used in the manufacture of flat panel display devices performs crystallization or phase change treatment on the deposited film in order to improve the properties of the film deposited on the substrate. [0003] Thin film transistors used as semiconductor layers in flat panel display devices use deposition equipment to deposit amorphous silicon on substrates such as glass or quartz. Dopants such as arsenic (Arsenic), phosphorus (Phosphorus) or boron (Boron). A crystallization process is then performed to convert the amorphous silicon layer with low electron mobility into a polysilicon layer w...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/67
CPCH01L21/67098H01L21/6776
Inventor 李炳一吴弘绿赵炳镐
Owner TERASEMICON CO LTD