High vacuum arc pump and its exhaust unit

Abstract

Disclosed are a high vacuum electric arc pump (1), and a high vacuum electric arc pump unit, a cryogenic high vacuum electric arc pump unit, a high vacuum evaporation coating unit and a cryogenic electric arc pump evaporation coating unit comprising the high vacuum electric arc pump, which belong to the field of vacuum production techniques. A high vapour pressure material is doped into a cathode target of a traditional electric arc pump, which substantially extends the high vacuum operating scope of the electric arc pump, and the high vapour pressure material is magnesium, aluminium, zinc or calcium, or a mixture of at least two thereof, and the high vapour pressure material has a weight percentage of 0.5-80% in the cathode target. A metal baffle plate (18) is provided between a cathode target (17) and an openable and closable panel (13) of the electric arc pump (1), and the metal baffle plate (18) is insulated from surrounding components, which eliminates the temperature rise of the panel (13), notably reduces the desorption of an adsorbed gas in the panel (13), and further improves the ultimate vacuum of the electric arc pump (1). In addition, the electric arc pump (1) is provided with a consumption forewarning measure for the cathode target (17), which effectively avoids the accident of burning through a cooling water jacket of the electric arc pump (1), and improves the reliability of the electric arc pump (1).

Description

technical field [0001] The invention belongs to the technical field of vacuum acquisition, and in particular relates to a high-vacuum arc pump and an air pumping unit thereof. Background technique [0002] Patent 201210170072.1 (a pumping system and process) [0003] Patent 201310241954.7 (vacuum furnace exhaust system and its exhaust process) [0004] Patent 201310242244.6 (evaporative coating equipment and its extraction process) [0005] Patent 201310241939.2 (plasma coating equipment and its extraction process) [0006] The above four patents propose an arc pump that uses arc discharge to achieve chemical adsorption pumping (usually using metal titanium as the adsorbent), and its pumping unit, pumping process and typical applications. The arc titanium pump has high pumping speed (it is easy to obtain tens of thousands of L / s high pumping speed), low energy consumption (about 1 / 3 of the traditional diffusion pump), quick start (several seconds to several minutes), and ...

AI Technical Summary

Problems solved by technology

[0007] 1. In the section where the pressure is ≤10-2 Pa, the density of space gas molecules is very low, electrons collide with gas molecules, and the probability of ionization is very small, so arc discharge cannot be maintained

[0008] 2. Part of the electrons emitted by the titanium target of the arc titanium pump will go around the back of the titanium target and flow into the pump casing panel that fixes the arc pump base. Multiple arc pump bases are usually installed on the pump casing panel. Therefore, it is difficult to achieve effective Cooling, resulting in local heating, releasing a large amount of desorbed gas, reducing the pumping efficiency and ultimate vacuum of the arc titanium pump

[0009] 3. When the cathode target is nearly exhausted, if the new target is not replaced in time, the arc will burn through the cooling water jacket of the arc pump base, resulting in production accidents

[0010]The above shortcomings limit the popularization and application of arc pumps

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