Low-temperature plasma exhaust gas purification device

Abstract

The invention relates to a low-temperature plasma exhaust gas purification device. The low-temperature plasma exhaust gas purification device comprises a low-temperature plasma reaction chamber, two ends of the low-temperature plasma reaction chamber are respectively provided with a gas inlet mechanism and a gas outlet mechanism, and several free radical emitters are arranged in the cavity of the low-temperature plasma reaction chamber. The low-temperature plasma exhaust gas purification device has optimal gas purification effects and improves gas purification efficiency.

Description

technical field [0001] The invention relates to a purification device, in particular to a low-temperature plasma waste gas purification device. Background technique [0002] Plasma is called the fourth form of matter, which is composed of electrons, ions, free radicals and neutral particles. The low-temperature plasma organic gas purifier uses plasma to repeatedly bombard odors at a rate of 8 million to 50 million times per second. The molecules of the gas deactivate, ionize, and crack various components in the exhaust gas, so that a series of complex chemical reactions such as oxidation occur, and then after multi-stage purification, the harmful substances are converted into clean air and released to nature. [0003] High-energy plasma deodorization can be divided into mica tube blocking discharge and corolla discharge technology according to the different ion tube excitation methods. No matter which discharge method is used, the power system uses modular components. The li...

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Problems solved by technology

A large number of experiments have shown that different structural shapes of the same material will have an impact on the number of high-energy ions; the way of positive and negative or one positive and one grounding of the inner and outer electrodes also has a great impact on the number of high-energy ions; therefore, the existing The low-temperature plasma exhaust gas purification equipment is still in its infancy in the research and development of dielectric materials, launch tube structures, and power supply devices.

[0004] Moreover, the exhaust gas intake of the existing low-temperature plasma exhaust gas purification equipment is not uniform enough and the flow rate and flow rate of the intake air cannot be adjusted, which cannot match the plasma output power of the free radical emission device in the low-temperature plasma reaction chamber. The gas purified by the equipment is directly discharged from the exhaust port of the low-temperature plasma reaction chamber. The "purified" gas content has not been checked at any time. If the activation, ionization, and cracking of the exhaust gas are not complete enough, it is easy to appear in the exhausted purified gas. Phenomena that contain exhaust gas

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