A multi-light source and large field of view splicing lighting system

Abstract

The present invention proposes a splicing lighting system with multiple light sources and large field of view, which is characterized in that it includes: multiple light sources, multiple optical fibers, and multiple lighting subsystems, and at least one light source is arranged between each light source and each lighting subsystem An optical fiber, the light is emitted by the light source, passes through the plurality of optical fibers and enters the plurality of illumination subsystems respectively, and forms an illumination field of view on the mask after being processed by the illumination subsystem. The technical scheme of splicing and coupling multiple optical fibers in the present invention can overcome the manufacturing difficulty of large-diameter multi-branch optical fibers and the limitation caused by the design and installation of the lamp house. The unevenness of the image plane caused by the failure of a single mercury lamp is overcome by the parallel plate / wedge plate adjustment device.

Description

technical field [0001] The invention relates to the field of integrated circuit equipment manufacturing, in particular to a multi-light source and large-field-of-view splicing lighting system for photolithography equipment. Background technique [0002] With the development of thin film field effect transistor TFT lithography technology, the size of the substrate is getting larger and more integrated units, it is difficult for a single lighting system to meet the needs of TFT lithography. In integrated circuit IC, packaging and other stepping lithography equipment, the maximum illumination field of view is generally 8 inches, and scanning lithography only has a larger field of view in the scanning direction, generally not exceeding 10 inches. However, the exposure field of view of TFT of more than five generations is above 17 inches, so the illumination field of view of a single lens is far from meeting the requirements of large field of view lithography. [0003] Using mul...

AI Technical Summary

Problems solved by technology

This solution mainly solves two problems: First, couple and decompose the energy of the light source into the branched exposure subsystem

When a single lamp goes out or fails, the initial light energy distribution on the object surface will change greatly, and the coupling group of the system does not have a corresponding adjustment device, which will reduce the uniformity of the illumination field of view of all subsystems, which is not conducive to lithography equipment long term stable job

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