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A kind of low dielectric constant polyimide film and preparation method thereof

A technology of polyimide film and low dielectric constant, applied in the field of low dielectric constant polyimide film and its preparation, can solve the problems of environmental pollution, complex process, high production cost, etc., and achieve good application prospects, distribution The effect of uniform and good mechanical properties

Active Publication Date: 2017-07-14
GUILIN ELECTRICAL EQUIP SCI RES INST
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The invention patents whose publication numbers are CN101560299A, CN1923877A or CN103383996A all disclose the preparation method of polyimide film with low dielectric constant, but they either have high production cost or complicated process, and need to use Hydrochloric acid, sulfuric acid and other organic acids or organic solvents will pollute the environment
At present, there is no relevant report on the preparation of low dielectric constant polyimide film with only melamine as the pore forming agent.

Method used

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  • A kind of low dielectric constant polyimide film and preparation method thereof
  • A kind of low dielectric constant polyimide film and preparation method thereof
  • A kind of low dielectric constant polyimide film and preparation method thereof

Examples

Experimental program
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Effect test

Embodiment 1

[0029] In this embodiment, the low dielectric constant polyimide film material has the following structural formula:

[0030]

[0031] The specific preparation method is:

[0032] 1) Add 10.0g (0.05mol) 4,4'-diaminodiphenylether (ODA) to 90g N-methylpyrrolidone in a three-necked flask, then add 3,3',4,4'-di Phenyl ether tetracarboxylic dianhydride (ODPA) (the molar ratio of ODA and ODPA is 1:1), stirred at 25°C for 5h until all dissolved to obtain a homogeneous solution A, and the solid content of the solution was adjusted to 20%;

[0033] 2) Add melamine equivalent to 0.2 times the weight of polyimide in the beaker, then add N-methylpyrrolidone equivalent to 10 times the weight of melamine, stir rapidly with a glass rod and disperse ultrasonically for 5 minutes, and the obtained white paste Add it to solution A, and at the same time use mechanical stirring and ultrasonic dispersion to disperse melamine evenly in the resin to obtain solution B;

[0034] 3) Vacuum debubble...

Embodiment 2

[0044] In this embodiment, the low dielectric constant polyimide film material has the following structural formula:

[0045]

[0046] The specific preparation method is:

[0047] 1) Add 10.0g (0.05mol) of 3,4'-diaminodiphenyl ether (3,4'-ODA) to a three-necked flask and dissolve it in 110g of N-methylpyrrolidone, then add 3,3',4 , 4'-diphenyl ether tetracarboxylic dianhydride (ODPA) (the molar ratio of 3,4'-ODA and ODPA is 1.1:1), stirred at 30°C for 6h until all dissolved to obtain a homogeneous solution A, adjust the solution The solids content is 15%;

[0048] 2) Add melamine equivalent to 0.4 times the weight of polyimide in the beaker, then add N-methylpyrrolidone equivalent to 10 times the weight of melamine, stir rapidly with a glass rod and disperse ultrasonically for 5 minutes, and the obtained white paste Add it to solution A, and at the same time use mechanical stirring and ultrasonic dispersion to disperse melamine evenly in the resin to obtain solution B;

[...

Embodiment 3

[0052] In this embodiment, the low dielectric constant polyimide film material has the following structural formula:

[0053]

[0054] The specific preparation method is:

[0055] 1) Add 9.9g (0.05mol) 4,4'-diaminodiphenylmethane (MDA) in a three-necked flask and dissolve it in 60g N,N-dimethylformamide, then add 3,3',4, 4'-diphenyl ether tetracarboxylic dianhydride (ODPA) (the molar ratio of MDA and ODPA is 0.9:1), stirred at 35°C for 4 hours until completely dissolved to obtain a homogeneous solution A, the solid content of the solution was 30%.

[0056] 2) Add melamine equivalent to 0.5 times the weight of polyimide in the beaker, then add N,N-dimethylformamide equivalent to 8 times the weight of melamine, stir rapidly with a glass rod and disperse ultrasonically for 5 minutes, and the obtained Add the white paste to solution A, and at the same time use mechanical stirring and ultrasonic dispersion to disperse melamine evenly in the resin to obtain solution B;

[0057]...

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Abstract

The invention discloses a low-dielectric-constant polyimide film and a preparation method thereof. The preparation method comprises the following steps: uniformly dispersing melamine in a polyamic acid solution, spreading the obtained resin solution to form a film, carrying out hot imidization to obtain a polyimide / melamine composite film, immersing the composite film in hot water to form pores, washing, and drying to obtain the low-dielectric-constant polyimide film, wherein the weight ratio of the melamine to the polyimide is (0.05-0.7):1. Compared with the prior art, only the melamine is used as the pore forming agent, and the hot water is used for dissolution for pore formation, so the pore forming technique is simple and easy to implement and is safe and environment-friendly; and the prepared low-dielectric-constant polyimide film has the advantages of uniform distribution of air pores, lower dielectric constant and favorable mechanical properties, and has favorable application prospects in the fields of electronics, micro-electronics and the like.

Description

technical field [0001] The invention relates to the technical field of polyimide materials, in particular to a low dielectric constant polyimide film and a preparation method thereof. Background technique [0002] Polyimide (PI) is the most important product among aromatic heterocyclic polymers. It has excellent comprehensive properties such as high temperature resistance, high mechanical strength, chemical stability, and good dimensional stability. It is widely used in aerospace, electrical, microelectronics and other industries. be widely used. [0003] With the rapid development of the electronics and microelectronics industry, the integration of electronic components is getting higher and higher, requiring the dielectric to have a lower dielectric constant. Polyimide is widely used in the microelectronics industry. However, the dielectric constant of ordinary imide is 3.2-3.9, which is difficult to meet the needs of future microelectronics technology development. There...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C08J9/26C08J5/18C08L79/08
Inventor 汪英任小龙周福龙王汝柯李耀星
Owner GUILIN ELECTRICAL EQUIP SCI RES INST