Multi-section detachable nozzle type silane ring and silane ring anti-clogging porous nozzle
A silane ring, multi-stage technology, applied in the direction of gaseous chemical plating, metal material coating process, coating, etc., can solve the problem of reducing the frequency of silane ring clogging, to reduce the probability of clogging, prolong the service life, increase the pipe wall area effect
Inactive Publication Date: 2017-01-11
TIANWEI NEW ENERGY HLDG
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Problems solved by technology
[0007] The purpose of the present invention is to provide a silane ring anti-clogging porous nozzle. The technical problem solved by the silane ring anti-clogging porous nozzle is to slow down the deposition of silicon nitride solid particles at the gas outlet of the silane ring, reduce the frequency of silane ring clogging, and the nozzle is detachable , Cleanable and reusable, so that this part can be replaced after the silane ring is deformed, without replacing the entire silane ring, which improves the operating rate of the equipment and reduces the cost of the silane ring
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Embodiment 1
[0034] like Figure 4 , Figure 5 Shown is the front and side structure schematic diagram of the multi-section detachable nozzle type silane ring in the present invention, including the nozzle disc body 41, the nozzle disc body 41 and the gas outlet of the silane ring (including the first gas outlet 31, The second air outlet 32 ) is in sealing fit, and the arrangement of the air outlet holes 42 on the nozzle plate body 41 is symmetrically distributed along the circumferential direction. The number of air outlet holes is 9, one of which is located in the center of the nozzle plate, and the other eight are arranged on the same circumference. The size, quantity, and arrangement of the air outlet holes are not limited here, and various schemes that can open holes on the body of the nozzle plate are all feasible. The flow rate of the gas outlet hole is greater than the flow rate of the direct pipeline outlet before the change, so that the ionized part -NH2+ and other active gro...
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The invention discloses an anti-blocking multi-hole spray nozzle for a silane ring. The anti-blocking multi-hole spray nozzle for the silane ring comprises a spray nozzle plate body; the spray nozzle plate body and an air outlet of the silane ring are in seal fit; at least one airflow outlet hole with the diameter being smaller than the air outlet diameter is formed in the spray nozzle plate body. After installation of the anti-blocking multi-hole spray nozzle for the silane ring, silicon nitride absorbing to the internal wall of the silane ring is reduced and accordingly the deposition time of silicon nitride inside the silane ring is effectively prolonged and the blocking probabilities are reduced. The invention also discloses a multi-section detachable spray nozzle type silane ring. The anti-blocking multi-hole spray nozzle for the silane ring is respectively arranged at a first air outlet of a first air outlet branched circuit pipeline and a second air outlet of a second air outlet branched circuit pipeline to prolong the service life of the silane ring; meanwhile a multi-section type structure is designed to solve the problem that a silane ring outlet is not convenient to replace caused by integral transformation.
Description
technical field [0001] The invention belongs to the technical field of solar cell production equipment, specifically the plasma enhanced chemical vapor deposition (PECVD) technical field, relates to a silane ring anti-blocking porous nozzle, and also relates to a multi-segment detachable nozzle type silane ring. Background technique [0002] Coating generally uses liquid or gas as a medium, and after the gas is ionized into plasma, it is further deposited on the substrate. The coating process of polycrystalline silicon solar cells is to use plasma enhanced chemical vapor deposition (PECVD) technology to continuously deposit silicon nitride anti-reflection film on the silicon wafer substrate. At present, there are many equipment that can realize PECVD, such as the coating equipment of OTB in the Netherlands. This equipment generates plasma through a DC ion source. It is characterized by the highest energy in the center of the plasma beam spot, and the more serious the energy ...
Claims
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IPC IPC(8): C23C16/455
Inventor 徐涛侯林均龙巍吴昕林洪峰
Owner TIANWEI NEW ENERGY HLDG