Array substrate, manufacturing method thereof, and display device
A technology of an array substrate and a manufacturing method, which is applied in the field of display, and can solve problems such as small storage capacitance and unfavorable display picture stability
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Embodiment 1
[0060] Such as figure 2 and image 3 As shown, the array substrate includes a base substrate 10, a gate line 20, a common electrode 21, and a gate insulating layer 30 ( figure 2 is a schematic plan view of the array substrate, figure 2 The gate insulating layer 30), the active layer 40, the data line 60, the source electrode 61 and the drain electrode 62 arranged on the same layer cannot be seen in the array substrate. The array substrate also includes a pixel electrode 50, and the pixel electrode 50 and the active layer 40 are the same layer settings. At this time, the storage capacitor is the capacitance formed by the pixel electrode 50, the gate insulating layer 30 and the common electrode 21, while in the prior art the storage capacitor is the capacitance formed by the pixel electrode, the passivation layer, the gate insulating layer and the common electrode, and Compared with the prior art, the insulating layer in the storage capacitor in the embodiment of the prese...
Embodiment 2
[0071] An embodiment of the present invention provides a method for manufacturing an array substrate. The method for manufacturing an array substrate is used to manufacture the array substrate described in Embodiment 1. Specifically, the manufacturing process of the array substrate is as follows: Figure 4 shown, including Figure 5 steps shown.
[0072] Step S501 , forming a pattern including gate lines 20 and common electrodes 21 on the base substrate 10 .
[0073] Firstly, a gate metal layer is deposited on the base substrate 10; secondly, a pattern including gate lines 20 and common electrodes 21 is formed through a patterning process. It should be noted that, unless otherwise emphasized, the patterning process in this application includes: coating photoresist, covering with a mask plate having a corresponding pattern, exposing, developing, etching and stripping the photoresist.
[0074] It should be noted that, in the embodiment of the present invention, no gate is form...
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